Development of a laser-produced plasma source at 13.5 nm for the French extreme ultraviolet lithography test bench

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 139-144

  Segers, M ^a   Bougeard, M ^a   Caprin, E ^a   Ceccotti, T ^a   Normand, D ^a   Schmidt, M ^a   Sublemontier, O ^a  

^a DIF   (France)

Author keywords

Debris free source; EUV lithography; EUV source; Laser produced plasma; Xenon target

Indexed keywords

COST EFFECTIVENESS; LASER PRODUCED PLASMAS; LITHOGRAPHY; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

MICROELECTRONICS;

EID: 0036643620     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00578-6     Document Type: Conference Paper

References (10)

1. Flying circus EUV sources comparison