High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm

Applied Optics

Volumn 39, Issue 21, 2000, Pages 3678-3682

  Klosner, Marc A ^a,b   Silfvast, William T ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Anvik Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH TEMPERATURE EFFECTS; IMAGING SYSTEMS; LASER PULSES; LIGHT EMISSION; LITHOGRAPHY; MIRRORS;

CAPILLARY DISCHARGES;

ULTRAVIOLET RADIATION;

EID: 0000560775     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.003678     Document Type: Article

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