High-power source and illumination system for Extreme Ultraviolet Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3767, Issue , 1999, Pages 136-142

  Kubiak, Glenn D ^a   Bernardez, Luis J ^a   Krenz, Kevin ^a   Replogle, William C ^a   Sweatt, William C ^a   Sweeney, Donald W ^a   Hudyma, Russell M ^a   Shields, Harry ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

JETS; OPTICALLY PUMPED LASERS; SEMICONDUCTOR LASERS; SOLID STATE LASERS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033361591     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)