Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas

Journal of the Optical Society of America B: Optical Physics

Volumn 17, Issue 7, 2000, Pages 1279-1290

  Klosner, M A ^a,b   Silfvast, W T ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Anvik Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRON ENERGY LEVELS; SPECTRUM ANALYSIS; XENON;

CAPILLARY DISCHARGES;

PLASMAS;

EID: 0034376419     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.17.001279     Document Type: Article

References (18)

1. M. A. Klosner and W. T. Silfvast, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm wavelength region," Opt. Lett. 23, 1609-1611 (1998).
2. M. A. Klosner, "Intense capillary discharge plasma extreme-ultraviolet sources for EUV lithography and other EUV imaging applications," Ph.D. dissertation (University of Central Florida, Orlando, Florida, 1998).
3. D. Stearns, R. Rosen, and S. Vernon, "Multilayer mirror technology for soft x-ray projection lithography," Appl. Opt. 32, 6952-6959 (1993).
4. K. M. Skulina, C. S. Alford, R. M. Bionta, D. M. Makowiecki, E. M. Gullikson, R. Soufli, J. B. Kortright, and J. H. Underwood, "Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet," Appl. Opt. 34, 3727-3730 (1995).
5. N. M. Ceglio, A. M. Hawryluk, and G. E. Sommargren, "Front-end design issues in soft-x-ray projection lithography," Appl. Opt. 34, 7050-7056 (1993).
6. E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994).
7. J. Blackburn, P. K. Carroll, J. Costello, and G. O'Sullivan, "Spectra of Xe VII, VII, and IX in the extreme ultraviolet: 4d-mp, nf transitions," J. Opt. Soc. Am. 73, 1325-1329 (1983).
8. 85p transitions in nine-times ionized xenon (Xe x)," J. Opt. Soc. Am. 73, 691-693 (1983).
9. G. O'Sullivan, "Charge-dependent wavefunction collapse in ionized xenon," J. Phys. B 15, L765-L771 (1982).
10. W. T. Silfvast.
11. M. McGeoch, "Radio-frequency pre-ionized xenon z-pinch source for extreme ultraviolet lithography," Appl. Opt. 37, 1651-1658 (1998).
12. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, and R. Lebert, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma," Appl. Opt. 38, 5413-5417 (1999).
13. I. Hutchinson, Principles of Plasma Diagnostics (Cambridge University Press, New York, 1987).
14. Y. Raizer and Y. Zel'dovich, Physics of Shock Waves and High-Temperature Hydrodynamic Phenomena (Academic, New York, 1966).
15. J. J. Rocca, D. C. Beethe, and M. C. Marconi, "Proposal for soft-x-ray and XUV lasers in capillary discharges," Opt. Lett. 13, 565-567 (1988).
16. M. Pöckl, M. Hebenstreit, T. Neger, and F. Aumayr, "Timedependent collisional-radiative model for capillary discharge plasmas," J. Appl. Phys. 76, 733-737 (1994).
17. G. O'Sullivan and P. Carroll, "4d-4f emission resonances in laser-produced plasmas," J. Opt. Soc. Am. 71, 227-230 (1981).
18. L. House, "Ionization equilibrium of the elements H to Fe," Astrophys. J., Suppl. 81, 307-328 (1963).