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Volumn 70, Issue 2, 2000, Pages 305-308

Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000951834     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003400050050     Document Type: Article
Times cited : (118)

References (6)
  • 4
    • 0042214446 scopus 로고    scopus 로고
    • Electron-Beam, X-ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
    • ed. by D.E. Seager SPIE, Bellingham
    • H. Fiedorowicz, A. Bartnik, J. Kostecki, M. Szczurek: Electron-Beam, X-ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, Proc. SPIE, Vol. 2723, ed. by D.E. Seager (SPIE, Bellingham 1996) p. 310
    • (1996) Proc. SPIE , vol.2723 , pp. 310
    • Fiedorowicz, H.1    Bartnik, A.2    Kostecki, J.3    Szczurek, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.