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Pure and Applied Chemistry

Volumn 77, Issue 2, 2005, Pages 379-389

Exploration of the deposition limits of microcrystalline silicon

(1) Mataras, D a

a UNIVERSITY OF PATRAS (Greece)

Author keywords

Microcrystalline silicon; Plasma enhanced CVD; Silane

Indexed keywords

HYDROGEN; RADICAL; SILANE; SILANE DERIVATIVE; SILICON; SILICON DIOXIDE;

CONFERENCE PAPER; DEVICE; DILUTION; FILM; HALOGENATION; METHODOLOGY; PARAMETER; PRESSURE;

EID: 15344345944 PISSN: 00334545 EISSN: None Source Type: Journal
DOI: 10.1351/pac200577020379 Document Type: Conference Paper

Times cited : (13)

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