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Volumn 266-269 A, Issue , 2000, Pages 450-454

Amorphous silicon deposited at high growth rates near the onset of microcrystallinity

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EID: 0347741302 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(00)00029-6 Document Type: Article

Times cited : (3)

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