VHF plasma processing for in-line deposition systems

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 16-20

  Rudiger J ^a   Brechtel, H ^a   Kottwitz, A ^a   Kuske, J ^b   Stephan, U ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Forsch /AP GmbH D   (Germany)

Author keywords

Microcrystalline silicon; RF deposition; VHF plasma

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; ELECTRODES; ETCHING; THIN FILMS; TRANSISTORS;

MICROCRYSTALLINE SILICON;

PLASMAS;

EID: 0037416763     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01174-4     Document Type: Conference Paper

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