Deposition rate optimization in SiH4/H2 PECVD of hydrogenated microcrystalline silicon

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 15-18

  Amanatides, E ^a   Mataras, D ^a   Rapakoulias, D E ^a  

^a UNIVERSITY OF PATRAS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; HYDROGEN; HYDROGENATION; MASS TRANSFER; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SILANES;

MICROCRYSTALLINE SILICON;

SEMICONDUCTING FILMS;

EID: 0035247516     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01603-5     Document Type: Article

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