Velocity distributions in magnetron sputter

IEEE Transactions on Plasma Science

Volumn 26, Issue 6, 1998, Pages 1635-1644

  Shon, C H ^a   Lee, J K ^a   Lee, H J ^b   Yang, Y ^b   Chung, T H ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Dong A University   (South Korea)

Author keywords

Kinetic simulation; Magnetron; Sheath; Sputter; Velocity distribution

Indexed keywords

EID: 0000781665     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.747881     Document Type: Article

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