Radial current distribution at a planar magnetron cathode

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 6, Issue 3, 1988, Pages 1827-1831

  Wendt, A E ^a   Lieberman, M A ^a   Meuth, H ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84956037963     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.575263     Document Type: Article

References (8)

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6. S. M. Rossnagel and H. R. Kaufman, J. Vac. Sci. Technol. A5, 88 (1987).
7. G. Schmidt, Physics ofHigh Temperature Plasmas (Academic, New York, 1979), p. 29.
8. A. M. Winslow, J. Comput. Phys. 2, 149 (1967)