Kinetic and steady-state properties of magnetron sputter with three-dimensional magnetic field

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4440-4449

  Shon, Chae Hwa ^a   Park, Jun Seong ^a   Kang, Bong Koo ^a   Lee, Jae Koo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CODES (SYMBOLS); COMPUTER SIMULATION; ELECTRONS; ESTIMATION; GEOMETRY; IONS; MAGNETIC FIELDS; MAGNETRON SPUTTERING; REACTION KINETICS; THREE DIMENSIONAL;

MAGNETRON SYSTEMS; PLASMA PROPERTIES; STEADY STATE PROPERTIES;

PLASMA SIMULATION;

EID: 0033157441     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4440     Document Type: Article

References (21)

1. K. Nanbu, S. Segawa and S. Kondo: Vacuum 47 (1996) 1013.
2. K. Nanbu and S. Kondo: Jpn. J. Appl. Phys. 36 (1997) 4808.
3. S. Ido and K. Nakamura: Jpn. J. Appl. Phys. 32 (1993) 5698.
4. S. Ido and K. Nakamura: Jpn. J. Appl. Phys. 35 (1996) 2302.
5. S. Ido, T. Suzuki and M. Kashiwagi: Jpn. J. Appl. Phys. 37 (1998) 965.
6. E. Shidoji, M. Nemoto, T. Nomura and Y. Yoshikawa: Jpn. J. Appl. Phys. 33 (1994) 4281.
7. T. Kobayashi, K. Itagaki, T. Uchiyama, T. Tsukada and N. Hosokawa: Proc. 3rd Int. Symp. Sputtering and Plasma Processes, June, 1995, Tokyo, p. 23.
8. J. H. Billen and L. M. Young: Poisson Superfish (Los Alamos National Laboratory, 1997).
9. OPERA-3d Reference Manual (Vector Fields Limited, Oxford, 1994).
10. J. P. Verboncoeur, A. B. Langdon and N. T. Gladd: Comp. Phys. Commun. 87 (1995) 199.
11. N. F. Cramer: J. Phys. D 30 (1997) 2573.
12. J. W. Bradley: Plasma Sources Sci. Technol. 5 (1996) 622.
13. Y. S. Moon: private communication.
14. K. Kuwahara and H. Fujiyama: IEEE Trans. Plasma Sci. 22 (1994) 442.
15. M. A. Lieberman and A. J. Lichtenberg: Principles of Plasma Discharges and Materials Processing (John Wiley and Sons, Inc, New York, 1994) p. 522.
16. C. H. Shon, J. K. Lee, H. J. Lee, Y. K. Shin, Y. Yang and T. H. Chung: IEEE Trans. Plasma Sci. 26 (1998) 1635.
17. R. K. Porteous and D. B. Graves: IEEE Trans. Plasma Sci. 19 (1991) 204.
18. R. K. Porteous, H-M Wu and D. B. Graves: Plasma Sources Sci. Technol. 3 (1993) 25.
19. Y. K. Shin, C. H. Shon, H. S. Lee, W. Kim and J. K. Lee: Proc. 18th Int. Display Research Conf. Asia Display '98, Seoul, 1998, p. 609.
20. R. Krimke and H. M. Urbassek: Plasma Sources Sci. Technol. 5 (1996) 389.
21. S. M. Rossnagel and H. R. Kaufman: J. Vac. Sci. & Technol. A 4 (1986) 1822.