Influence of gas pressure and magnetic field upon dc magnetron discharge

Vacuum

Volumn 60, Issue 3, 2001, Pages 299-306

  Shidoji, Eiji ^a   Ness, Kevin ^b   Makabe, Toshiaki ^c  

^a ASAHI GLASS CO LTD   (Japan)

^b JAMES COOK UNIVERSITY   (Australia)

^c KEIO UNIVERSITY   (Japan)

Author keywords

Magnetron; Plasma; Simulation; Sputtering process

Indexed keywords

COMPUTER SIMULATION; ELECTRIC POTENTIAL; MAGNETIC FIELD EFFECTS; MATHEMATICAL MODELS; PLASMAS; PRESSURE EFFECTS;

MAGNETRON DISCHARGES;

MAGNETRON SPUTTERING;

EID: 0034817583     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00408-5     Document Type: Article

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