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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 5 A, 2001, Pages 3354-3358

Sub-300 Å (Bax,Sr1-x)TiO3 films by metal organic chemical vapor deposition: Nanostructure, step coverage, and dielectric properties

(9) Dey, Sandwip K a Majhi, Prashant a Shin, Yong W a Tang, Derek a Kirby, Aaron a Zhao, Jun b Dornfest, Charles b Lou, Lee b Kher, Shreyas b

a Arizona State University (United States)

b APPLIED MATERIALS INC (United States)

Author keywords

BST; HRTEM; MOCVD; Nanostructure evolution; Roughness

Indexed keywords

ASPECT RATIO; BARIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; STOICHIOMETRY; SUBSTRATES;

POLYCRYSTALLINE FILMS;

THIN FILMS;

EID: 0035328437 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.3354 Document Type: Article

Times cited : (6)

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