Deposition characteristics of (Ba, Sr)TiO3 thin films by liquid source metal-organic chemical vapor deposition at low substrate temperatures

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6946-6952

  Kang, Chang Seok ^a   Cho, Hag Ju ^a   Hwang, Cheol Seong ^a   Lee, Byoung Taek ^a   Lee, Ki Hun ^a   Horii, Hideki ^a   Kim, Wan Don ^a   Lee, Sang In ^a   Lee, Moon Yong ^a  

^a Seoyoung Engineering   (South Korea)

Author keywords

BST; Haze; Liquid delivery; MOCVD; Step coverage uniformity; Substrate temperature

Indexed keywords

AGGLOMERATION; BARIUM TITANATE; CRYSTALLINE MATERIALS; HIGH TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLATINUM; SILICA; SILICON WAFERS; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS;

BARIUM STRONTIUM TITANATE (BST);

DIELECTRIC FILMS;

EID: 0031274337     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.6946     Document Type: Article

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