Processing technologies for ferroelectric thin films and heterostructures

Annual Review of Materials Science

Volumn 28, Issue 1, 1998, Pages 501-531

  Auciello, Orlando ^a   Foster, Chris M ^a   Ramesh, Rammamoorthy ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

Laser ablation deposition; Metalorganic chemical vapor deposition; Microstructure; Nonvolatile ferroelectric memories; Sputter deposition

Indexed keywords

CAPACITORS; DIELECTRIC FILMS; FERROELECTRIC MATERIALS; HETEROJUNCTIONS; LASER ABLATION; LEAD COMPOUNDS; METALLORGANIC VAPOR PHASE EPITAXY; MICROSTRUCTURE; NONVOLATILE STORAGE; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; THIN FILMS;

LEAD ZIRCONATE TITANATE; STRONTIUM BISMUTH TANTALATE;

RANDOM ACCESS STORAGE;

EID: 0031634352     PISSN: 00846600     EISSN: None     Source Type: Journal    
DOI: 10.1146/annurev.matsci.28.1.501     Document Type: Article

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