PE-MOCVD of dielectric thin films: Challenges and opportunities

MRS Bulletin

Volumn 21, Issue 6, 1996, Pages 44-48

  Dey, Sandwip K ^a   Alluri, Prasad V ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON CYCLOTRON RESONANCE; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PEROVSKITE; PLASMA APPLICATIONS; PROCESS CONTROL; THIN FILMS;

DIELECTRIC THIN FILMS; PLASMA ENHANCED METALLORGANIC CHEMICAL VAPOR DEPOSITION; PRECURSORS;

DIELECTRIC FILMS;

EID: 0030169909     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/S0883769400046078     Document Type: Article

References (7)

1. S.K. Dey, in Ferroelectric Thin Films: Synthesis and Basic Properties, vol. 10, edited by C. Paz de Araujo, J.F. Scott, and G.W. Taylor (Gordon and Breach, New York, 1996).
2. M. Yoshida, H. Yamaguchi, T. Sakuma, Y. Miyasaka, P-Y. Lesaicherre, and A. Ishitani, J. Electrochem. Soc. 142 (1995) p. 244.
3. P.C. Van Buskirk, J.F. Roeder, and S. Bilodeau, Integrated Ferroelectrics 10 (1995) p. 9.
4. D.M. Manos and H.F. Dylla, in Plasma Etching, edited by D.M. Manos and D.L. Flamm (Academic Press, New York, 1989).
5. MRS Bulletin XX (5) (1995).
6. T.S. Cale, in Modeling and Simulation of Thin-Film Processing, edited by D.J. Srolovitz, C.A. Volkert, M.J. Fluss, and R.J. Kee (Mater. Res. Soc. Symp. Proc. 389, Pittsburgh, 1995) p. 95.
7. T.S. Cale, M.K. Jain, and G.B. Raupp, J. Electrochem. Soc. 137 (1990) p. 1526.