The dielectric response as a function of temperature and film thickness of fiber-textured (Ba,Sr)TiO3 thin films grown by chemical vapor deposition

Journal of Applied Physics

Volumn 82, Issue 5, 1997, Pages 2497-2504

  Basceri, Cem ^a   Streiffer, S K ^a   Kingon, Angus I ^a   Waser, R ^b  

^a Campus Box 7908   (United States)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; CAPACITORS; ELECTRIC FIELD EFFECTS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUMERICAL ANALYSIS; OXIDES; POLARIZATION; RANDOM ACCESS STORAGE; TEXTURES; THERMAL EFFECTS; THIN FILMS;

BULK CURIE POINT; LANDAU-GINZBURG-DEVONSHIRE THEORY; POWER SERIES EXPANSION;

DIELECTRIC MATERIALS;

EID: 0031234721     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366062     Document Type: Article

References (48)

1. A. F. Tasch and Laureen H. Parker, Proc. IEEE 77, 374 (1989).
2. P. C. Fazan, Integr. Ferroelectr. 4, 247 (1994).
3. B. Gnade, S. R. Summerfeit, and D. Crenshaw, in Science and Technology of Electroceramic Thin Films, NATO ASI Series, Vol. 284, edited by O. Auciello and R. Waser (Kluwer Academic, London, 1995), p. 373.
4. A. I. Kingon, S. K. Streiffer, C. Basceri, and S. R. Summerfelt, Mater. Res. Bull. 21, 46 (1996).
5. M. E. Lines and A. M. Glass, Principles and Applications of Ferroelectrics and Related Materials (Clarendon, Oxford, 1977), p. 71.
6. A. F. Devonshire, Philos. Mag. 740, 1040 (1949); 742, 1065 (1949); Adv. Phys. 3, 85 (1954).
7. A. F. Devonshire, Philos. Mag. 740, 1040 (1949); 742, 1065 (1949); Adv. Phys. 3, 85 (1954).
8. A. F. Devonshire, Philos. Mag. 740, 1040 (1949); 742, 1065 (1949); Adv. Phys. 3, 85 (1954).
9. R. D. King-Smith and D. Vanderbilt, Phys. Rev. B 49, 5828 (1994); W. Zhong, R. D. King-Smith, and D. Vanderbilt, Phys. Rev. Lett. 72, 3618 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. Lett. 73, 1861 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. B 52, 6301 (1995); W Zhong, D. Vanderbilt, R. D. King-Smith, and K. Rabe, Ferroelectrics 164, 291 (1995).
10. R. D. King-Smith and D. Vanderbilt, Phys. Rev. B 49, 5828 (1994); W. Zhong, R. D. King-Smith, and D. Vanderbilt, Phys. Rev. Lett. 72, 3618 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. Lett. 73, 1861 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. B 52, 6301 (1995); W Zhong, D. Vanderbilt, R. D. King-Smith, and K. Rabe, Ferroelectrics 164, 291 (1995).
11. R. D. King-Smith and D. Vanderbilt, Phys. Rev. B 49, 5828 (1994); W. Zhong, R. D. King-Smith, and D. Vanderbilt, Phys. Rev. Lett. 72, 3618 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. Lett. 73, 1861 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. B 52, 6301 (1995); W Zhong, D. Vanderbilt, R. D. King-Smith, and K. Rabe, Ferroelectrics 164, 291 (1995).
12. R. D. King-Smith and D. Vanderbilt, Phys. Rev. B 49, 5828 (1994); W. Zhong, R. D. King-Smith, and D. Vanderbilt, Phys. Rev. Lett. 72, 3618 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. Lett. 73, 1861 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. B 52, 6301 (1995); W Zhong, D. Vanderbilt, R. D. King-Smith, and K. Rabe, Ferroelectrics 164, 291 (1995).
13. R. D. King-Smith and D. Vanderbilt, Phys. Rev. B 49, 5828 (1994); W. Zhong, R. D. King-Smith, and D. Vanderbilt, Phys. Rev. Lett. 72, 3618 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. Lett. 73, 1861 (1994); W. Zhong, D. Vanderbilt, and K. M. Rabe, Phys. Rev. B 52, 6301 (1995); W Zhong, D. Vanderbilt, R. D. King-Smith, and K. Rabe, Ferroelectrics 164, 291 (1995).
14. R. Waser, Integrated Ferroelectrics 15, 39 (1997), and references cited therein.
15. K. Abe and S. Komatsu, Jpn. J. Appl. Phys. 1 31, 2985 (1992).
16. S. K. Dey, P. Alluri, J.-J. Lee, and R. Zuleeg, Integr. Ferroelectr. 7, 341 (1995); S. K. Dey, J.-J. Lee, and P. Alluri, Jpn. J. Appl. Phys. 1 34, 3142 (1995).
17. S. K. Dey, P. Alluri, J.-J. Lee, and R. Zuleeg, Integr. Ferroelectr. 7, 341 (1995); S. K. Dey, J.-J. Lee, and P. Alluri, Jpn. J. Appl. Phys. 1 34, 3142 (1995).
18. R. Waser, in Science and Technology of Electroceramic Thin Films, NATO ASI Series, Vol. 284, edited by O. Auciello and R. Waser (Kluwer Academic, London, 1995), p. 223.
19. G. W. Dietz, W. Antpohler, M. Klee, and R. Waser, J. Appl. Phys. 78, 1 (1995).
20. C. Basceri, S. K. Streiffer, A. I. Kingon, S. Bilodeau, R. Carl, P. C. van Buskirk, S. R. Summerfelt, P. McIntyre, and R. Waser, Mater. Res. Soc. Symp. Proc. 433, 285 (1996).
21. G. W. Dietz, R. Waser, S. K. Streiffer, C. Basceri, and A. I. Kingon, J. Appl. Phys. 82, 2359 (1997).
22. K. C. Kao and W. Hwang, Electrical Transpart in Solids (Pergamon, New York, 1981).
23. J. G. Simmons, J. Phys. Chem. Solids 32, 1987 (1971); 32, 2581 (1971).
24. J. G. Simmons, J. Phys. Chem. Solids 32, 1987 (1971); 32, 2581 (1971).
25. M. Copel, P. R. Duncombe, D. A. Neumayer, T. M. Shaw, and R. M. Tromp, Appl. Phys. Lett. 70, 3227 (1997).
26. S. K. Streiffer, C. Basceri, A. I. Kingon, S. Lipa, S. Bilodeau, R. Carl, and P. C. van Buskirk, Mater. Res. Soc. Symp. Proc. 415, 219 (1996).
27. V. Chivukula, J. Ilowski, I. Emesh, D. McDonald, P. Leung, and M. Sayer, Integr. Ferroelectr. 10, 247 (1995).
28. J. Curie, Ann. Chim. Phys. 18, 203 (1889); E. von Schweidler, Ann. Phys. 24, 711 (1907).
29. J. Curie, Ann. Chim. Phys. 18, 203 (1889); E. von Schweidler, Ann. Phys. 24, 711 (1907).
30. S. K. Streiffer, C. Basceri, A. I. Kingon, M. Schumacher, G. W. Dietz, and R. Waser (unpublished).
31. G. Rupprecht, R. O. Bell, and B. D. Silverman, Phys. Rev. 123, 97 (1961).
32. A. K. Tagantsev, Sov. Phys. JETP 50, 948 (1979).
33. H.-M. Christen, J. Mannhart, E. J. Williams, and Ch. Gerber, Phys. Rev. B 49, 95 (1994).
34. R. A. van der Berg, P. W. M. Blom, J. F. M. Cillessen, and R. M. Wolf, Appl. Phys. Lett. 66, 697 (1995).
35. P. Kirlin, S. Bilodeau, and P. C. van Buskirk, Integr. Ferroelectr. 7, 307 (1995); P. C. van Buskirk, J. F. Roeder, and S. Bilodeau, ibid. 10, 9 (1995).
36. P. Kirlin, S. Bilodeau, and P. C. van Buskirk, Integr. Ferroelectr. 7, 307 (1995); P. C. van Buskirk, J. F. Roeder, and S. Bilodeau, ibid. 10, 9 (1995).
37. S. R. Summerfelt, D. Kotecki, A. I. Kingon, and H. N. Al-Shareef, Mater. Res. Soc. Symp. Proc. 361, 257 (1995).
38. T. Horikawa, N. Mikami, T. Makita, J. Tanimura, M. Kataoka, K. Sato, and M. Nunoshita, Jpn. J. Appl. Phys. 1 32, 4126 (1993).
39. K. Abe and S. Komatsu, Jpn. J. Appl. Phys. 1 33, 5297 (1994); K. Abe and S. Komatsu, J. Appl. Phys. 77, 6461 (1995).
40. K. Abe and S. Komatsu, Jpn. J. Appl. Phys. 1 33, 5297 (1994); K. Abe and S. Komatsu, J. Appl. Phys. 77, 6461 (1995).
41. R. Waser, T. Baiatu, and K.-H. Härdtl, J. Am. Ceram. Soc. 73, 1645 (1990); 73, 1654 (1990); 73, 1663 (1990).
42. R. Waser, T. Baiatu, and K.-H. Härdtl, J. Am. Ceram. Soc. 73, 1645 (1990); 73, 1654 (1990); 73, 1663 (1990).
43. R. Waser, T. Baiatu, and K.-H. Härdtl, J. Am. Ceram. Soc. 73, 1645 (1990); 73, 1654 (1990); 73, 1663 (1990).
44. C. Basceri, M. A. Wells, S. K. Streiffer, A. I. Kingon, S. Bilodeau, R. Carl, P. C. van Buskirk, S. R. Summerfelt, and P. McIntyre, Proceedings of the Tenth IEEE International Symposium on Application of Ferroelectrics, edited by B. Kulwicki, A. Ahmin, and A. Safari (IEEE, Piscataway, NJ, 1996), p. 51.
45. Landolt-Börnstein Numerical Data and Functional Relationships in Science and Technology, New Series, Group III: Crystal and Solid State Physics, Vol. 16(a), edited by K.-H. Hellwege (Springer, Berlin, 1981), p. 416.
46. L. E. Cross (private communication).
47. W. Zhong and D. Vanderbilt, Phys. Rev. B 53, 5047 (1996).
48. P. K. Larsen, G. J. M. Dormans, D. J. Taylor, and P. J. van Veldhoven, J. Appl. Phys. 76, 2405 (1994).