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Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 250-255

Introducing atomic layer epitaxy for the deposition of optical thin films

(4) Riihelä, Diana a Ritala, Mikko a Matero, Raija a Leskelä, Markku a

a UNIVERSITY OF HELSINKI (Finland)

Author keywords

Aluminium oxide; Atomic layer epitaxy (ALE); Optical coatings; Zinc sulphide

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; EPITAXIAL GROWTH; OPTICAL COATINGS; OPTICAL MULTILAYERS; PERFORMANCE; SPECTROSCOPY; ZINC COMPOUNDS;

ATOMIC LAYER EPITAXY; ZINC SULPHIDE;

OPTICAL FILMS;

EID: 0030284420 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)08890-6 Document Type: Article

Times cited : (80)

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