Properties of (Nb1-xTax)2O5 solid solutions and (Nb1-xTax)2O5-ZrO2 nanolaminates grown by Atomic Layer Epitaxy

Nanostructured Materials

Volumn 8, Issue 7, 1997, Pages 785-793

  Kukli, K ^a,b   Ritala, M ^b   Leskela M ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTALLINE MATERIALS; LEAKAGE CURRENTS; NANOSTRUCTURED MATERIALS; NIOBIUM COMPOUNDS; SOLID SOLUTIONS; SURFACE STRUCTURE; TANTALUM; WATER; X RAY SPECTROSCOPY; ZIRCONIA;

ATOMIC LAYER EPITAXY; ENERGY DISPERSIVE X RAY SPECTROSCOPY; NIOBIUM ETHOXIDE;

DIELECTRIC MATERIALS;

EID: 0031251542     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0965-9773(98)00003-8     Document Type: Article

References (33)

1. Moazzami, R., Hu, C. and Shepherd, W.H., IEEE Transact. Electron Devices, 1992, 39, 2044.
2. Ono, Y. A., Electroluminescent Displays, World Scientific Series on Information Display - Vol. 1, World Scientific, Singapore, 1995.
3. Fukao, R., Fujikawa, H., Nakamura, M., Hamakawa, Y. and Ibuki, S., in Electroluminescence, Springer Proceedings in Physics Vol. 38, eds. S. Shionoya and H. Kobayashi, Springer-Verlag, Berlin Heidelberg, 1989.
4. Streiffer, S.K. and Kingon, A.I., Nature, 1995, 377, 194.
5. Rack, P.D., Naman, A., Holloway, P.H., Sun, S.-S. and Tuenge, R.T., MRS Bulletin, 1996, 21, 49.
6. Kattelus, H., Ylilammi, M., Salmi, J., Ranta-aho, T., Nykänen, E. and Suni, I., Materials Research Society Symposium Proceedings, 1993, 284, 511.
7. Kukli, K., Ritala, M. and Leskelä, M., Journal of the Electrochemical Society, 1995, 142, 1670.
8. Kukli, K., Ihanus, J., Ritala, M. and Leskelä, M., Applied Physics Letters, 1996, 68, 3737.
9. Kukli, K., Ihanus, J., Ritala, M. and Leskelä, M., Journal of the Electrochemical Society, 1997, 144, 300.
10. Suntola, T., Thin Solid Films, 1992, 216, 84.
11. Suntola, T., Materials Science Report, 1989, 7, 266.
12. Tiku, S.K. and Rustomji, S.H., IEEE Transactions of Electronic Devices, 1989, 36, 1947.
13. Fujikawa, H. and Taga, Y., Journal of Applied Physics, 1994, 75, 2538.
14. Cava, R.J., Peck, Jr, W.F., Krajewski, J.J. and Roberts, G.L., Materials Research Bulletin, 1996, 31, 295.
15. Cava, R.J., Krajewski, J.J., Peck, Jr., W.F., and Roberts, G.L., Journal of Materials Research, 1996, 11, 1428.
16. Kukli, K., Ritala, M. and Leskelä, M., Advanced Materials CVD, 1998, 4, in press.
17. Ylilammi, M. and Ranta-aho, T., Thin Solid Films, 1993, 232, 56 .
18. Duffy, M.T., Wang, C.C., Waxman, A. and Zaininger, K.H., Journal of the Electrochemical Society, 1969, 116, 234.
19. Fuschillo, N., Lalevic, B. and Annamalai, N.K., Thin Solid Films, 1975,30,145.
20. Pignolet, A., Rao, G.M. and Kruphanidhi, K.B., Thin Solid Films, 1995, 261, 18.
21. Joint Committee of Powder Diffraction Standards, Cards 17-923 and 13-307.
22. Gazaux, J., X-Ray Spectrometry, 1996, 25, 265.
23. Amberg, M. and Gunter, J.R., Solid State Ionics, 1996, 84, 313.
24. Gutzow, I. and Avramov, I., Thin Solid Films, 1981, 85, 203.
25. Gopalakhrisnan, J., Chemistry of Materials, 1995, 7, 1265.
26. Chakravorty, D. and Giri, A.K., in Chemistry of Advanced Materials, Nanomaterials, ed. C.N.R. Rao, p. 217, Blackwell Scientific Publications, Oxford, 1993.
27. Wang, F. and Northwood, D.O., Journal of Materials Science, 1995, 30, 4003.
28. Kim, D.-Y., Park, H.-J. and Cho, D.-H., Solid State Ionics, 1995, 80, 67.
29. Scanlan, C.M., Gajdardziska-Josifovska, M. and Aita, C.R., Applied Physics Letters, 1994, 64, 3548.
30. Thompson, D.P., Dickins, A.M. and Thorp, J.S. Journal of Materials Science, 1992, 27, 2267.
31. Garvie, R.C. and Goss, M.F., Journal of Materials Science, 1986, 21, 1253.
32. Aita, C.R., Wiggins, M.D., Whig, R., Scanlan, C.M. and Gajdarziska-Josifovska, M., Journal of Applied Physics, 1996, 79, 1176.
33. Gerstenberg, D., in Handbook of Thin Film Technology, Thin Film Capacitors, ed. L. I. Maissel and R. Glang, p.19-8, McGraw-Hill, New York, 1970.