Surface chemistry of In 2 O 3 deposition using In(CH 3 ) 3 and H 2 O in a binary reaction sequence

Applied Surface Science

Volumn 112, Issue , 1997, Pages 205-215

  Ott, A W ^a   Johnson, J M ^a   Klaus, J W ^a   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDES; PYROLYSIS; SATURATION (MATERIALS COMPOSITION); SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING SILICON; SURFACE PHENOMENA; THERMODYNAMIC STABILITY; WATER;

BINARY REACTION; INDIUM OXIDES; TRIMETHYLINDIUM;

DEPOSITION;

EID: 0031547019     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00977-4     Document Type: Article

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