Polysilicon integrated microsystems: Technologies and applications

Sensors and Actuators, A: Physical

Volumn 56, Issue 1-2, 1996, Pages 167-177

  Howe, Roger T ^a   Boser, Bernhard E ^a   Pisano, Albert P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Integrated microsystems; Polysilicon

Indexed keywords

ACTUATORS; ANNEALING; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; CRYSTAL MICROSTRUCTURE; INTEGRATED CIRCUIT MANUFACTURE; MECHANICAL PROPERTIES; OPTICAL CORRELATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SILICON SENSORS;

MONOLITHIC POLYSILICON INTEGRATED SENSORS; POLYSILICON INTEGRATED MICROSYSTEMS;

MICROELECTROMECHANICAL DEVICES;

EID: 0030206394     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(96)01291-5     Document Type: Article

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