Stress gradients in thin films used in micro-electro-mechanical systems

American Society of Mechanical Engineers, Dynamic Systems and Control Division (Publication) DSC

Volumn 46, Issue , 1993, Pages 89-95

  Johnson, George C ^a   Krulevitch, Peter ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); METALLOGRAPHIC MICROSTRUCTURE; PROCESSING; SILICON; STRESSES; THIN FILMS;

DOPED FILMS; MICRO ELECTRO MECHANICAL SYSTEMS; POLYCRYSTALLINE SILICON; STRESS GRADIENTS;

ELECTROMECHANICAL DEVICES;

EID: 0027710777     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)