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Volumn , Issue , 1996, Pages 44-48
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Integrating SCREAM micromachined devices with integrated circuits
a
a
Cornell Univ
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(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
ASPECT RATIO;
CHEMICAL VAPOR DEPOSITION;
FIELD EFFECT TRANSISTORS;
INTEGRATED CIRCUIT MANUFACTURE;
LITHOGRAPHY;
MASKS;
OPERATIONAL AMPLIFIERS;
REACTIVE ION ETCHING;
SEMICONDUCTING SILICON;
SINGLE CRYSTALS;
MICROMACHINED DEVICES;
OPTICAL LITHOGRAPHY;
PHYSICAL VAPOR DEPOSITION;
SINGLE CRYSTAL SILICON REACTIVE ETCHING AND METALLIZATION;
INTEGRATED CIRCUITS;
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EID: 0029732345
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (35)
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References (26)
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