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Advanced Materials Interfaces

Volumn 3, Issue 21, 2016, Pages

Sequential Regeneration of Self-Assembled Monolayers for Highly Selective Atomic Layer Deposition

(2) Hashemi, Fatemeh Sadat Minaye a Bent, Stacey F a

a Stanford University (United States)

Author keywords

area selective ALD; self assembled monolayers; ZnO

Indexed keywords

EID: 84989246667 PISSN: None EISSN: 21967350 Source Type: Journal
DOI: 10.1002/admi.201600464 Document Type: Article

Times cited : (69)

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