Improving area-selective molecular layer deposition by selective SAM removal

ACS Applied Materials and Interfaces

Volumn 6, Issue 20, 2014, Pages 17831-17836

  Prasittichai, Chaiya ^a,b   Pickrahn, Katie L ^a   Minaye Hashemi, Fatemeh Sadat ^a   Bergsman, David S ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

^b KASETSART UNIVERSITY   (Thailand)

Author keywords

molecular layer deposition (MLD); organic thin film; patterned organic structures; reductive SAM desorption; selective deposition; self assembled monolayer

Indexed keywords

ATOMIC LAYER DEPOSITION; SILICON; THIN FILMS;

MOLECULAR LAYER DEPOSITION; MOLECULAR LAYER DEPOSITIONS (MLD); NEGATIVE POTENTIAL; OCTADECYLPHOSPHONIC ACIDS; ORGANIC STRUCTURES; ORGANIC THIN FILMS; SELECTIVE ADSORPTION; SELECTIVE DEPOSITION;

SELF ASSEMBLED MONOLAYERS;

EID: 84908199300     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am504441e     Document Type: Article

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