Nanoimprint lithography: Challenges and prospects

Nanotechnology

Volumn 12, Issue 2, 2001, Pages 91-95

  Zankovych, S ^a   Hoffmann, T ^b   Seekamp, J ^a   Bruch, J U ^c   Sotomayor Torres, C M ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b IMEC   (Belgium)

^c INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; OPTICAL RESOLVING POWER; POLYMETHYL METHACRYLATES; THROUGHPUT; VISCOELASTICITY;

NANOIMPRINT LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0035356844     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/12/2/303     Document Type: Conference Paper

References (12)