Obtaining nanoimprint template gratings with 10 nm half-pitch by atomic layer deposition enabled spacer double patterning

Nanotechnology

Volumn 24, Issue 10, 2013, Pages

  Dhuey, S ^a   Peroz, C ^b   Olynick, D ^a   Calafiore, G ^a   Cabrini, S ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b ABEAM TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HALF PITCHES; NANO-IMPRINT; PITCH GRATING; SPACER DOUBLE PATTERNING; STEP-AND-REPEAT; THROUGH PITCH; ULTRA-VIOLET;

ELECTRON BEAM LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY;

ATOMIC LAYER DEPOSITION;

EID: 84874251835     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/10/105303     Document Type: Article

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