Correction to: Wafer-Scale Selective-Area Deposition of Nanoscale Metal Oxide Features Using Vapor Saturation into Patterned Poly(methyl methacrylate) Templates (Adv. Mater. Interfaces., (2016), 3, (1500431), 10.1002/admi.201500431);Wafer-Scale Selective-Area Deposition of Nanoscale Metal Oxide Features Using Vapor Saturation into Patterned Poly(methyl methacrylate) Templates

Advanced Materials Interfaces

Volumn 3, Issue 2, 2016, Pages

  Dandley, Erinn C ^a   Lemaire, Paul C ^a   Zhu, Zhongwei ^b   Yoon, Alex ^b   Sheet, Lubab ^b   Parsons, Gregory N ^a  

^a North Carolina State University   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

atomic layer deposition; e beam lithography; nanopatterning; pattern shrinking; selective deposition

Indexed keywords

ATOMIC LAYER DEPOSITION; ESTERS; METALLIC COMPOUNDS; NANOTECHNOLOGY; ORGANOMETALLICS; OXIDE FILMS; POLYMERS; SILICON WAFERS;

E-BEAM LITHOGRAPHY; LATERAL DIMENSION; METAL OXIDE FILM; NANOPATTERNING; NANOSCALE FEATURES; POLYMER THICKNESS; REACTANT EXPOSURES; SELECTIVE DEPOSITION;

METALS;

EID: 84955658570     PISSN: None     EISSN: 21967350     Source Type: Journal    
DOI: 10.1002/admi.201601178     Document Type: Erratum

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