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Volumn 47, Issue 4, 2014, Pages 1411-1418

Sub-5 nm domains in ordered poly(cyclohexylethylene)- block -poly(methyl methacrylate) block polymers for lithography

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Indexed keywords


EID: 84894662729     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/ma4020164     Document Type: Article
Times cited : (200)

References (75)
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    • International Technology Roadmap for Semiconductors (ITRS).
    • International Technology Roadmap for Semiconductors (ITRS); www.itrs.net.
  • 5
    • 0026107359 scopus 로고
    • Bates, F. S. Science 1991, 251, 898-905
    • (1991) Science , vol.251 , pp. 898-905
    • Bates, F.S.1
  • 75
    • 0035545980 scopus 로고    scopus 로고
    • ODT values. Calculations and further information can be found in the Supporting Information.
    • ODT values. Calculations and further information can be found in the Supporting Information. Andersen, T. H.; Tougaard, S.; Larsen, N. B.; Almdal, K.; Johannsen, I. J. Electon Spectrosc. 2001, 121, 93-110
    • (2001) J. Electon Spectrosc. , vol.121 , pp. 93-110
    • Andersen, T.H.1    Tougaard, S.2    Larsen, N.B.3    Almdal, K.4    Johannsen, I.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.