Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 11, Issue 3, 2012, Pages

  Gronheid, Roel ^a   Rincon Delgadillo, Paulina A ^a,b   Younkin, Todd R ^c   Pollentier, Ivan ^a   Somervell, Mark ^d   Hooge, Joshua S ^d   Nafus, Kathleen ^e   Nealey, Paul F ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c INTEL CORPORATION   (United States)

^d TOKYO ELECTRON AMERICA INC   (United States)

^e TOKYO ELECTRON LTD   (Japan)

Author keywords

defectivity; directed self assembly; frequency multiplication; grapho epitaxy; lamella; prepattern

Indexed keywords

BLOCK COPOLYMERS; EPITAXIAL GROWTH; LAMELLAR STRUCTURES; OPTIMIZATION; PHOTORESISTS;

DEFECTIVITY; DIRECTED SELF-ASSEMBLY; FREQUENCY MULTIPLICATION; GRAPHO-EPITAXY; LAMELLA; PREPATTERN;

SELF ASSEMBLY;

EID: 84863735208     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.11.3.031303     Document Type: Article

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