Defect source analysis of directed self-assembly process

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 3, 2013, Pages

  Delgadillo, Paulina Rincon ^a,b,c   Suri, Mayur ^d   Durant, Stephane ^d   Cross, Andrew ^d   Nagaswami, Venkat R ^d   Heuvel, Dieter Van Den ^a   Gronheid, Roel ^a   Nealey, Paul ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c UNIVERSITY OF CHICAGO   (United States)

^d KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION EQUIPMENT; OPTICAL TESTING; SELF ASSEMBLY;

CONTROL REQUIREMENTS; DIRECTED SELF-ASSEMBLY; FREQUENCY MULTIPLICATION; IMMERSION LITHOGRAPHY; MULTIPLE PROCESS; OPTICAL INSPECTION; OPTICAL INSPECTION SYSTEMS; SOURCE ANALYSIS;

DEFECTS;

EID: 84892687013     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.3.031112     Document Type: Article

References (9)

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