Status and challenges in electrical diagnostics of processing plasmas

Surface and Coatings Technology

Volumn 260, Issue , 2014, Pages 401-410

  Stamate, Eugen ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Electrical probes; Plasma diagnostics; Plasma sheath lens; Thermal probes

Indexed keywords

DEPOSITION; ELECTRONICS INDUSTRY; ETCHING; NANOELECTRONICS; NEGATIVE IONS; PLASMA DIAGNOSTICS; PROBES;

DEVICE FABRICATIONS; ELECTRICAL DIAGNOSTICS; ELECTRICAL PROBES; PLASMA-SHEATH LENS; PROCESSING PLASMA; SURFACE CONTAMINATIONS; THERMAL PROBE; THIN-FILM DEPOSITIONS;

PLASMA SHEATHS;

EID: 84918833955     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2014.09.070     Document Type: Article

References (68)

1. Han J.G. J. Phys. D. Appl. Phys. 2009, 42:043001.
2. Kelly P.J., Arnell R.D. Vacuum 2000, 56:159.
3. Anders A. Surf. Coat. Technol. 2005, 200:1893.
4. Tachi S. J. Vac. Sci. Technol. A 2003, 21:S131.
5. Abe H., Yoneda M., Fujiwara N. Jpn. J. Appl. Phys. 2008, 47:1435.
6. Pelletier J., Anders A. IEEE Trans. Plasma Phys. 2005, 33:1944.
7. Chu P.K. Surf. Coat. Technol. 2013, 229:2.
8. Meyyappan M. J. Phys. D. Appl. Phys. 2011, 44:174002.
9. Ostrikov K. Rev. Mod. Phys. 2005, 77:489.
10. Franklin R.N. Plasma Sources Sci. Technol. 2002, 11:A31.
11. Demidov V.I., Ratynskaia S.V., Rypdal K. Rev. Sci. Instrum. 2002, 73:3409.
12. Godyak V.A., Demidov V.I. J. Phys. D. Appl. Phys. 2011, 44:233001.
13. Braithwaite N.S., Allen J.E. J. Phys. D. Appl. Phys. 1998, 21:1733.
14. Oksuz L., Soberón F., Ellingboe A.R. J. Appl. Phys. 2006, 99:013304.
15. Bredin J., Chabert P., Aanesland A. Appl. Phys. let. 2013, 102:154107.
16. Stenzel R.L. Phys. Rev. Lett. 1988, 60:704.
17. Kokura H., Nakamura K., Ghanashev I.P., Sugai H. Jpn. J. Appl. Phys. 1999, 38:5262.
18. Bliokh Yu.P., Brodsky Yu.L., Chashka Kh.B., Felsteiner J., Slutsker Ya.Z. J. Appl. Phys. 2008, 103:053303.
19. Hoskinson A.R., Hershkowitz N. Plasma Sources Sci. Technol. 2006, 15:85.
20. Godyak V.A., Piejak R.B., Alexandrovich B.M. J. Appl. Phys. 1993, 73:3657.
21. Fernandez Palop J.I., Ballesteros J., Colomer V., Hernandez M.A. Rev. Sci. Instrum. 1995, 66:4625.
22. Ahn T.H., Nakamura K., Sugai H. Jpn. J. Appl. Phys. 1995, 34:L1405.
23. Hopkins M.B., Graham W.G. Rev. Sci. Instrum. 1986, 57:2217.
24. Koo Bon-Woong, Hershkowitz Noah, Sarfaty Moshe J. Appl. Phys. 1999, 86:1213.
25. Kim J.-W., Cho S.-G., Bae M.-K., Kim H.-J., Chung T.H., Chung K.-S. Jpn. J. Appl. Phys. 2013, 52:11NC03.
26. Pustylnik M., Ohon N., Takamura S. Jpn. J. Appl. Phys. 2006, 45:926.
27. Draghici M., Stamate E. J. Appl. Phys. 2010, 107:123304.
28. Draghici M., Stamate E. J. Phys. D. Appl. Phys. 2010, 43:155205.
29. Stamate E., Ohe K. Appl. Phys. Lett. 2001, 78:153.
30. Stamate E., Ohe K. J. Vac. Sci. Technol. A 2002, 20:661.
31. Amemiya H. J. Phys. D Appl. Phys. 1990, 23:999.
32. Amemiya H. Jpn. J. Appl. Phys. 1986, 25:595.
33. Amemiya H. J. Phys. Soc. Jpn. 1988, 57:887.
34. Kimura T., Inagaki K., Ohe K. J. Phys. D Appl. Phys. 1998, 31:2295.
35. Naser M., Fujita H. J. Phys. D. Appl. Phys. 2000, 33:2781.
36. Stamate E., Popa G., Ohe K. Rev. Sci. Instrum. 1999, 70:58.
37. Stamate E., Ohe K. J. Appl. Phys. 1998, 84:2450.
38. Kersten H., Deutsch H., Steffen H., Kroesen G.M.W., Hippler R. Vacuum 2001, 63:385.
39. Kersten H., Stoffels E., Stoffels W.W., Otte M., Csambal C., Deutsch H., Hippler R. J. Appl. Phys. 2000, 87:3637.
40. Kersten H., Rohde D., Berndt J., Deutsch H., Hippler R. Thin Solid Films 2000, 377-378:585.
41. Stamate E., Ohe K., Sugai H. Appl. Phys. Lett. 2002, 80:3066.
42. Makrinich G., Fruchtmana A. J. Appl. Phys. 2006, 100:093302.
43. Piejaky R., Godyaky V., Alexandrovichy B., Tishchenkoz N. Plasma Sources Sci. Technol. 1998, 7:590.
44. Stamate E., Sugai H. Phys. Rev. Lett. 2005, 94:125004.
45. Stamate E., Sugai H. Phys. Rev. E. 2005, 72:036407.
46. Stamate E. Plasma Phys. Contr. Fusion 2012, 54:124048.
47. Stamate E., Sugai H., Takai O., Ohe K. J. Appl. Phys. 2004, 95:830.
48. Bacal M., Hamilton G.W., Bruneteau A.M., Doucet H.J. Rev. Sci. Instrum. 1979, 50:719.
49. Stamate E., Draghici M. J. Appl. Phys. 2012, 111:083383.
50. Liberman M.A., Lichtenberg A.J. Principles of Plasma Discharges and Materials Processing 1994, 11-14. Wiley-Interscience, New York, (Chaps.).
51. Laframboise J.G. Report No. 100 1966, University of Toronto, Institute of Aerospace Studies.
52. Steinbruchel C. J. Vac. Sci. Technol. A 1990, 8:1663.
53. Johnson J.D., Holmes A.J.T. Rev. Sci. Instrum. 1990, 61:2628.
54. Stamate E., Inagaki K., Ohe K., Popa G. J. Phys. D. Appl. Phys. 1999, 32:671.
55. Stamate E., Popa G. Proc. Int. Conf. Plasma Phys. Nagoya 1996, 2:1518.
56. Ruscanu D., Popa G., Stamate E. Proc. Int. Conf. Plasma Phys. Innsbruck 1992, 2:1179.
57. Ruscanu D., Popa G., Anita V., Hodoroaba V.D. Rom. J. Phys. 1997, 49:491.
58. Stamate E., Ohe K. J. Appl. Phys. 2001, 89:2058.
59. Emeleus K.G., Breslin Int A.C. J. Electron. 1970, 29:1.
60. Nakao S., Stamate E., Sugai H. Thin Solid Films 2007, 515:4869.
61. Bacal M. Nucl. Fusion 2006, 46:S250.
62. Medicus G. J. Appl. Phys. 1966, 37:215.
63. Stamate E., Ohe K. Appl. Phys. Lett. 2001, 79:2665.
64. Pandey A., Sakakibara W., Matsoka H., Nakamura K., Sugai H. Appl. Phys. Lett. 2014, 104:024111.
65. Samara V., Booth J.P., de Marneffe J.-F., Milenin A.P., Brouri M., Boullart W. Plasma Sources Sci. Technol. 2012, 21:065004.
66. Donnelly V.M. J. Appl. Phys. D Appl. Phys. 2004, 37:R217.
67. Sasaki K., Ryota A. Jpn. J. Appl. Phys. 2011, 50:08JB02.
68. Cunge G., Bodart P., Brihoum M., Boulard F., Chevolleau T., Sadeghi N. Plasma Sources Sci. Technol. 2012, 21:024006.