Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lens

Physical Review Letters

Volumn 94, Issue 12, 2005, Pages

  Stamate, E ^a   Sugai, H ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PASSIVE SURFACE (PS); PLANAR ELECTRODES; PLASMA-SHEATH LENS; SPACE CHARGE LAYERS;

ANISOTROPY; ELECTRODES; ETCHING; ION IMPLANTATION; MATHEMATICAL MODELS; NEGATIVE IONS; PLASMA SHEATHS; POSITIVE IONS;

LENSES;

EID: 18144429872     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.94.125004     Document Type: Article

References (14)

1. I. Langmuir, Phys. Rev. 33, 954 (1929).
2. V. Godyak and N. Stemberg, Phys. Plasmas 9, 4427 (2002).
3. R. N. Franklin and J. Snell, Phys. Plasmas 8, 643 (2001).
4. K.-U. Riemann and L. Tsendin, J. Appl. Phys. 90, 5487 (2001).
5. V. Vahedi, R. A. Stewart, and M. A. Lieberman, J. Vac. Sci. Technol. A 11, 1275 (1993).
6. A. Kono, Phys. Plasmas 10, 4181 (2003).
7. R. A. Gottscho, Phys. Rev. A 36, 2233 (1987).
8. I. J. Donnelly and P. A. Watterson, J. Phys. D 22, 90 (1989).
9. T. E. Seridan, Appl. Phys. Lett. 68, 1918 (1996).
10. D. Kim and D. J. Economou, J. Appl. Phys. 94, 2852 (2003).
11. E. V. Barnat and G. A. Hebner, Appl. Phys. Lett. 85, 3393 (2004).
12. E. Stamate and K. Ohe, Appl. Phys. Lett. 78, 153 (2001).
13. E. Stamate, H. Sugai, O. Takai, and K. Ohe, J. Appl. Phys. 95, 830 (2004).
14. E. Stamate and K. Ohe, J. Appl. Phys. 84, 2450 (1998).