A dc-pulsed capacitively coupled planar Langmuir probe for plasma process diagnostics and monitoring

Plasma Sources Science and Technology

Volumn 21, Issue 6, 2012, Pages

  Samara V ^a   Booth, J P ^b   De Marneffe, J F ^a   Milenin, A P ^a   Brouri, M ^c   Boullart, W ^a  

^a IMEC   (Belgium)

^b ECOLE POLYTECHNIQUE   (France)

^c LAM RESEARCH CORPORATION   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE VALUES; CAPACITIVELY COUPLED; FILM PARAMETERS; I - V CURVE; ION FLUXES; IV CHARACTERISTICS; LITERATURE DATA; PLANAR LANGMUIR PROBES; PLASMA CONDITIONS; PLASMA PROCESS;

ELECTRON TRANSITIONS; PLASMA THEORY; PROBES;

LANGMUIR PROBES;

EID: 84870346300     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/6/065004     Document Type: Article

References (13)

1. Braithwaite N S J, Booth J-P and Cunge G 1996 A novel electrostatic probe method for ion flux measurements Plasma Sources Sci. Technol. 5 677
2. Booth J-P, Braithwaite N S J, Goodyear A and Barroy P 2000 Measurements of characteristic transients of planar electrostatic probes in cold plasmas Rev. Sci. Instrum. 71 2722
3. Braithwaite N S J, Sheridan T E and Boswell R W 2003 Transient RF self-bias in electropositive and electronegative plasmas J. Phys. D: Appl. Phys. 36 2837-44
4. Booth J-P, Curley G, Maric D and Chabert P 2010 Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux Plasma Sources Sci. Technol. 19 015005
5. Petcu M C, Bronneberg A C, Sarkar A, Blauw M A, Creatore M and van de Sanden M C M 2008 A capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas Rev. Sci. Instrum. 79 115104
6. Waymouth J F 1959 Pulse technique for probe measurements in gas discharges J. Appl. Phys. 30 1404
7. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (Hoboken, NJ: Wiley)
8. Curley G A, Marić D, Booth J-P, Corr C S, Chabert P and Guillon J 2007 Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas Plasma Sources Sci. Technol. 16 S87-93 (Pubitemid 46485509)
9. Solomon M L, Teodoru S and Popa G 2008 Secondary electron emission at Langmuir probe surface J. Optoelectron. Adv. Mater. 10 2011-14
10. Phelps A V and Petrovic Z L 1999 Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons Plasma Sources Sci. Technol. 8 R21-44
11. Qin S, Bradley M P, Kellerman P L and Saadatmand K 2002 Measurements of secondary electron emission and plasma density enhancement for plasma exposed surfaces using an optically isolated Faraday cup Rev. Sci. Instrum. 73 1153 (Pubitemid 34406167)
12. Lee S, Kim J and Lee J 2003 Secondary electron ejection from the MgO protection layer in AC plasma display panels for low-energy noble ions Thin Solid Films 435 69-71
13. Rakhimova T V, Braginsky O V, Ivanov V V, Kim T K, Kong J T, Kovalev A S, Lopaev D V, Mankelevich Y A, Proshina O V and Vasilieva A N 2006 Experimental and theoretical study of RF plasma at low and high frequency IEEE Trans. Plasma Sci. 34 867-77