SCOPUS 정보 검색 플랫폼

Plasma Physics and Controlled Fusion

Volumn 54, Issue 12, 2012, Pages

Discrete and modal focusing effects: Principles and applications

(1) Stamate, E a

a TECHNICAL UNIVERSITY OF DENMARK (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE FLUX; DIFFERENT GEOMETRY; ELECTRODE SURFACES; FOCUSING EFFECT; ION DOSE UNIFORMITY; ION IMPACT; PASSIVE SURFACES; PHENOMENOLOGICAL ASPECTS; PLASMA IMMERSION ION IMPLANTATION; POTENTIAL APPLICATIONS; SHEATH EDGE; THREE DIMENSIONAL SIMULATIONS;

ELECTRODES; ELECTROSTATIC LENSES; ION BOMBARDMENT; ION IMPLANTATION; MASS SPECTROMETRY; PLASMA APPLICATIONS; PLASMA SHEATHS;

FOCUSING;

EID: 84870232371 PISSN: 07413335 EISSN: 13616587 Source Type: Journal
DOI: 10.1088/0741-3335/54/12/124048 Document Type: Article

Times cited : (8)

References (49)

1
- 84862531478
- 10.1088/0022-3727/45/25/253001 0022-3727 253001
- Samukawa S et al 2012 J. Phys. D: Appl. Phys. 45 253001
- (2012) J. Phys. D: Appl. Phys. , vol.45
- Samukawa, S.¹

2
- 49749085683
- 10.1143/JJAP.47.1435 0021-4922
- Abe H et al 2008 Japan. J. Appl. Phys. 47 1435
- (2008) Japan. J. Appl. Phys. , vol.47 , pp. 1435
- Abe, H.¹

3
- 30544434362
- Plasma-based ion implantation and deposition: A review of physics, technology, and applications
- DOI 10.1109/TPS.2005.860079
- Pelletier J et al 2005 IEEE Trans. Plasma Sci. 33 1944 (Pubitemid 43078267)
- (2005) IEEE Transactions on Plasma Science , vol.33 , Issue.6 , pp. 1944-1959
- Pelletier, J.¹ Anders, A.²

4
- 13444266367
- Reactive magnetron sputtering of thin films: Present status and trends
- DOI 10.1016/j.tsf.2004.07.041, PII S0040609004009332
- Musil J et al 2005 Thin Solid Films 475 208 (Pubitemid 40210991)
- (2005) Thin Solid Films , vol.475 , Issue.1-2 SPEC. ISS. , pp. 208-218
- Musil, J.¹ Baroch, P.² Vlcek, J.³ Nam, K.H.⁴ Han, J.G.⁵

5
- 80052789291
- 10.1021/nl201821j 1530-6984
- Chen Y et al 2011 Nano Lett. 11 3774
- (2011) Nano Lett. , vol.11 , pp. 3774
- Chen, Y.¹

6
- 79953701033
- 0963-0252 025008
- Chiper A S et al 2011 Plasma Sources Sci. Technol. 20 025008
- (2011) Plasma Sources Sci. Technol. , vol.20
- Chiper, A.S.¹

7
- 84860865562
- 10.1016/j.jpowsour.2012.03.110 0378-7753
- Hussain A M 2012 J. Power Sources 212 247
- (2012) J. Power Sources , vol.212 , pp. 247
- Hussain, A.M.¹

8
- 79954615784
- 10.1088/0022-3727/44/17/174002 0022-3727 174002
- Mayyappan M 2011 J. Phys. D: Appl. Phys. 44 174002
- (2011) J. Phys. D: Appl. Phys. , vol.44
- Mayyappan, M.¹

9
- 26244451229
- Reactive plasmas as a versatile nanofabrication tool
- DOI 10.1103/RevModPhys.77.489
- Ostrikov K 2005 Rev. Mod. Phys. 77 489 (Pubitemid 41508765)
- (2005) Reviews of Modern Physics , vol.77 , Issue.2 , pp. 489-511
- Ostrikov, K.¹

10
- 20844433074
- Sheaths: More complicated than think
- DOI 10.1063/1.1887189, 055502
- Hershkowitz N 2005 Phys. Plasmas 12 055502 (Pubitemid 40860896)
- (2005) Physics of Plasmas , vol.12 , Issue.5 , pp. 1-11
- Hershkowitz, N.¹

11
- 64249137057
- 0963-0252 014007
- Riemann K U 2009 Plasma Sources Sci. Technol. 18 014007
- (2009) Plasma Sources Sci. Technol. , vol.18
- Riemann, K.U.¹

12
- 2442496523
- 10.1088/0022-3727/37/9/007 0022-3727
- Franklin R N 2004 J. Phys. D: Appl. Phys. 37 1342
- (2004) J. Phys. D: Appl. Phys. , vol.37 , pp. 1342
- Franklin, R.N.¹

13
- 0042428846
- 10.1109/TPS.2003.815812 0093-3813
- Sternberg N et al 2003 IEEE Trans. Plasma Sci. 31 665
- (2003) IEEE Trans. Plasma Sci. , vol.31 , pp. 665
- Sternberg, N.¹

14
- 0345045572
- Czarnetzki U et al 1999 Plasma Phys. Sci. Technol. 8 230
- (1999) Plasma Phys. Sci. Technol. , vol.8 , pp. 230
- Czarnetzki, U.¹

15
- 33846109937
- Distribution of electric field in the sheath of an electronegative plasma
- DOI 10.1063/1.2429026
- Takizawa K et al 2007 Appl. Phys. Lett. 90 011503 (Pubitemid 46068300)
- (2007) Applied Physics Letters , vol.90 , Issue.1 , pp. 011503
- Takizawa, K.¹ Kono, A.² Sasaki, K.³

16
- 33846274216
- Electric field profiles around an electrical probe immersed in a plasma
- DOI 10.1063/1.2404471
- Barnat E et al 2007 J. Appl. Phys. 101 013306 (Pubitemid 46120607)
- (2007) Journal of Applied Physics , vol.101 , Issue.1 , pp. 013306
- Barnat, E.V.¹ Hebner, G.A.²

17
- 1942456823
- 10.1063/1.1652249 0021-8979
- Doosik K et al 2004 J. Appl. Phys. 95 3311
- (2004) J. Appl. Phys. , vol.95 , pp. 3311
- Doosik, K.¹

18
- 24644476415
- Particle modelling of inductively-coupled argon plasmas with wafer biasing
- DOI 10.1088/0022-3727/38/18/022, PII S0022372705928520
- Takeida H et al 2005 J. Phys. D: Appl. Phys. 38 3461 (Pubitemid 41277564)
- (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.18 , pp. 3461-3468
- Takekida, H.¹ Nanbu, K.²

19
- 2142778955
- 10.1063/1.344172 0021-8979
- Lieberman M A 1989 J. Appl. Phys. 66 2926
- (1989) J. Appl. Phys. , vol.66 , pp. 2926
- Lieberman, M.A.¹

20
- 0001761135
- On the surface condition of Langmuir probes in reactive plasmas
- DOI 10.1063/1.1338489
- Stamate E et al 2001 Appl. Phys. Lett. 78 153 (Pubitemid 33661788)
- (2001) Applied Physics Letters , vol.78 , Issue.2 , pp. 153-155
- Stamate, E.¹ Ohe, K.²

21
- 0036565079
- Influence of surface condition in Langmuir probe measurements
- DOI 10.1116/1.1460893
- Stamate E et al 2002 J. Vac. Sci. Technol. A 20 661 (Pubitemid 34648306)
- (2002) Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films , vol.20 , Issue.3 , pp. 661-666
- Stamate, E.¹ Ohe, K.²

22
- 18844418966
- Visualization of the sheath-lens focusing effect to disk and square electrodes
- DOI 10.1109/TPS.2005.845127, Images in Plasma Science
- Stamate E et al 2005 IEEE Trans. Plasma Sci. 33 534 (Pubitemid 40679497)
- (2005) IEEE Transactions on Plasma Science , vol.33 , Issue.2 , pp. 534-535
- Stamate, E.¹ Sugai, H.²

23
- 28844495993
- Discrete focusing effect of positive ions by a plasma-sheath lens
- DOI 10.1103/PhysRevE.72.036407, 036407
- Stamate E et al 2005 Phys. Rev. E 72 036407 (Pubitemid 41778208)
- (2005) Physical Review E - Statistical, Nonlinear, and Soft Matter Physics , vol.72 , Issue.3 , pp. 1-7
- Stamate, E.¹ Sugai, H.²

24
- 18144429872
- Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lens
- DOI 10.1103/PhysRevLett.94.125004, 125004
- Stamate E et al 2005 Phys. Rev. Lett. 94 125004 (Pubitemid 40620551)
- (2005) Physical Review Letters , vol.94 , Issue.12 , pp. 1-4
- Stamate, E.¹ Sugai, H.²

25
- 0037793223
- Plasma diagnostics by detecting the ion flux profile to a biased-target
- DOI 10.1016/S0257-8972(03)00151-8, PII S0257897203001518
- Stamate E et al 2003 Surf. Coat. Technol. 169-170 65 (Pubitemid 36704800)
- (2003) Surface and Coatings Technology , vol.169-170 , pp. 65-68
- Stamate, E.¹ Ohe, K.² Takai, O.³ Sugai, H.⁴

26
- 1142280327
- 10.1063/1.1619225 0021-8979
- Stamate E et al 2003 J. Appl. Phys. 95 830
- (2003) J. Appl. Phys. , vol.95 , pp. 830
- Stamate, E.¹

27
- 22144461051
- Complex ion-focusing effect by the sheath above the wafer in plasma immersion ion implantation
- DOI 10.1063/1.1951045, 261501
- Stamate E et al 2005 Appl. Phys. Lett. 86 261501 (Pubitemid 40983186)
- (2005) Applied Physics Letters , vol.86 , Issue.26 , pp. 1-3
- Stamate, E.¹ Holtzer, N.² Sugai, H.³

28
- 33645282768
- 10.1016/j.tsf.2005.08.055 0040-6090
- Stamate E et al 2006 Thin Solid Films 506-507 571
- (2006) Thin Solid Films , vol.506-507 , pp. 571
- Stamate, E.¹

29
- 33947163881
- Investigation of the ion dose non-uniformity caused by sheath-lens focusing effect on silicon wafers
- DOI 10.1016/j.tsf.2006.10.099, PII S0040609006011771
- Holtzer N et al 2007 Thin Solid Films 515 4887 (Pubitemid 46399819)
- (2007) Thin Solid Films , vol.515 , Issue.12 , pp. 4887-4891
- Holtzer, N.¹ Stamate, E.² Toyoda, H.³ Sugai, H.⁴

30
- 34648833745
- Using transient sheath induced by short high-voltage pulse for uniform plasma ion implantation
- DOI 10.1143/JJAP.46.L858
- Holtzer N et al 2007 Japan. J. Appl. Phys. 46 L858 (Pubitemid 47463504)
- (2007) Japanese Journal of Applied Physics, Part 2: Letters , vol.46 , Issue.33-35
- Holtzer, N.¹ Sugai, H.² Saito, T.³ Stamate, E.⁴

31
- 33947139614
- Controlling the ion flux on substrates of different geometry by sheath-lens focusing effect
- DOI 10.1016/j.tsf.2006.10.071, PII S0040609006011849
- Stamate E et al 2007 Thin Solid Films 515 4853 (Pubitemid 46399826)
- (2007) Thin Solid Films , vol.515 , Issue.12 , pp. 4853-4859
- Stamate, E.¹ Sugai, H.²

32
- 36448999340
- Ion focusing by an expanding, two-dimensional plasma sheath
- DOI 10.1063/1.115625, PII S0003695196002136
- Sheridan T E 1996 Appl. Phys. Lett. 68 1918 (Pubitemid 126688424)
- (1996) Applied Physics Letters , vol.68 , Issue.14 , pp. 1918-1920
- Sheridan, T.E.¹

33
- 0345954494
- 10.1063/1.874162 1070-664X
- Sheridan T E 2000 Phys. Plasmas 7 3084
- (2000) Phys. Plasmas , vol.7 , pp. 3084
- Sheridan, T.E.¹

34
- 63749114144
- 0022-3727 015212
- Sheridan T E 2009 J. Phys. D: Appl. Phys. 42 015212
- (2009) J. Phys. D: Appl. Phys. , vol.42
- Sheridan, T.E.¹

35
- 33845808814
- Effects of potential and duration of pulse width on sheath dynamics related to a target with a groove in two-dimensional simulation
- DOI 10.1063/1.2400391
- Ghomi H et al 2006 J. Appl. Phys. 100 113301 (Pubitemid 46012124)
- (2006) Journal of Applied Physics , vol.100 , Issue.11 , pp. 113301
- Ghomi, H.¹ Sharifian, M.² Niknam, A.R.³ Shokri, B.⁴

36
- 77952686016
- 10.1143/JJAP.48.090209 0021-4922 090209
- Denpoh K et al 2009 Japan. J. Appl. Phys. 48 090209
- (2009) Japan. J. Appl. Phys. , vol.48
- Denpoh, K.¹

37
- 0033100603
- 10.1088/0022-3727/32/6/012 0022-3727
- Stamate E et al 1999 J. Phys. D: Appl. Phys. 32 671
- (1999) J. Phys. D: Appl. Phys. , vol.32 , pp. 671
- Stamate, E.¹

38
- 77950587034
- 10.1088/0022-3727/43/15/155205 0022-3727 155205
- Draghici M et al 2010 J. Phys. D: Appl. Phys. 43 155205
- (2010) J. Phys. D: Appl. Phys. , vol.43
- Draghici, M.¹

39
- 84860502346
- 10.1063/1.4704696 0021-8979 083303
- Stamate E et al 2012 J. Appl. Phys. 111 083303
- (2012) J. Appl. Phys. , vol.111
- Stamate, E.¹

40
- 0000880066
- Sample stage induced dose and energy nonuniformity in plasma immersion ion implantation of silicon
- DOI 10.1063/1.121755, PII S0003695198003283
- Fan Z et al 1998 Appl. Phys. Lett. 73 202 (Pubitemid 128673726)
- (1998) Applied Physics Letters , vol.73 , Issue.2 , pp. 202-204
- Fan, Z.¹ Chu, P.K.² Chan, C.³ Cheung, N.W.⁴

41
- 0009750460
- 10.1063/1.1707810 0021-8979
- Medicus G 1966 J. Appl. Phys. 37 215
- (1966) J. Appl. Phys. , vol.37 , pp. 215
- Medicus, G.¹

42
- 34948871509
- Engineering of nanostructured carbon materials with electron or ion beams
- DOI 10.1038/nmat1996, PII NMAT1996
- Krasheninnikov et al 2007 Nature Mater. 6 723 (Pubitemid 47515308)
- (2007) Nature Materials , vol.6 , Issue.10 , pp. 723-733
- Krasheninnikov, A.V.¹ Banhart, F.²

43
- 49749114396
- 10.1116/1.2955728 1071-1023 B
- Ivo U et al 2008 J. Vac. Sci. Technol. B 26 1197
- (2008) J. Vac. Sci. Technol. , vol.26 , pp. 1197
- Ivo, U.¹

44
- 84870181003
- Stamate E 2010 WO 2010/040805 A1
- (2010)
- Stamate, E.¹

45
- 0036860004
- Multi-dipolar plasmas for uniform processing: Physics, design and performance
- DOI 10.1088/0963-0252/11/4/307, PII S0963025202400588
- Lacoste A et al 2002 Plasma Sources Sci. Technol. 11 407 (Pubitemid 35433983)
- (2002) Plasma Sources Science and Technology , vol.11 , Issue.4 , pp. 407-412
- Lacoste, A.¹ Lagarde, T.² Bechu, S.³ Arnal, Y.⁴ Pelletier, J.⁵

46
- 84871023019
- WO
- Stamate E WO 2010/094605 A1
- Stamate, E.¹

47
- 84870154380
- Stamate E 2012 in preparation
- (2012)
- Stamate, E.¹

48
- 77954180020
- 10.1063/1.3452357 0021-8979 123304
- Draghici M et al 2010 J. Appl. Phys. 107 123304
- (2010) J. Appl. Phys. , vol.107
- Draghici, M.¹

49
- 79956053577
- Principle and application of a thermal probe to reactive plasmas
- DOI 10.1063/1.1473688
- Stamate E et al 2002 Appl. Phys. Lett. 80 3066 (Pubitemid 34562559)
- (2002) Applied Physics Letters , vol.80 , Issue.17 , pp. 3066
- Stamate, E.¹ Sugai, H.² Ohe, K.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.