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M. Gurfinkel, H.D. Xiong, K.P. Cheung, J.S. Suehle, J.B. Bernstein, Y. Shapira, A.J. Lelis, D. Habersat, and N. Goldsman, "Characterization of Transient Gate Oxide Trapping in SiC MOSFETs Using Fast I-V Techniques," IEEE Trans. Elec. Dev., 55(8), p. 2004 (2008).
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M. Grieb, M. Noborio, D. Peters, A. J. Bauer, P. Friedrichs, T. Kimoto, and H. Ryssel, "Comparison of the threshold-voltage stability of SiC MOSFETs with thermally grown and deposited gate oxides," Mater. Sci. Forum, 645-648, p. 681 (2010).
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H. Yano, Y. Oshiro, D. Okamoto, T. Hatayama, and T. Fuyuki, "Instability of 4H-SiC MOSFET Characteristics due to Interface Traps with Long Time Constants," Mater. Sci. Forum, 679-680, p. 603 (2011).
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S. DasGupta, R. Brock, R. Kaplar, M. Marinella, M. Smith, and S. Atcitty, "Extraction of trapped charge in 4H-SiC metal oxide semiconductor field effect transistors from subthreshold characteristics," Appl. Phys. Lett., 99, 023503 (2011).
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M. Okamoto, Y. Makifuchi, M. Iijima, Y. Sakai, N. Iwamuro, H. Kimura, K. Fukuda, and H. Okumura, "Coexistence of Small Threshold Voltage Instability and High Channel Mobility in 4H-SiC(000-1) Metal-Oxide-Semiconductor Field-Effect Transistors," Applied Physics Express, 5, 041302 (2012).
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Electrical impact of the aluminum p-implant annealing on lateral MOSFET transistors on 4H-sic n-epi
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S. Noll, D. Scholten, M. Grieb, A. Bauer, and L. Frey, "Electrical Impact of the Aluminum p-implant Annealing on Lateral MOSFET Transistors on 4H-SiC n-epi," Mater. Sci. Forum, 740-742, p. 521 (2013).
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Interface defects and negative bias temperature instabilities in 4H-sic PMOSFETs - A combined DCIV/SDR study
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T. Aichinger, P. Lenahan, and D. Peters, "Interface defects and negative bias temperature instabilities in 4H-SiC PMOSFETs - a combined DCIV/SDR study," Mater. Sci. Forum, 740-742, p. 529 (2013).
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Novel approach for improving interface quality of 4H-sic MOS devices with UV irradiation and subsequent thermal annealing
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H. Watanabe, D. Ikeguchi, T. Kirino, S. Mitani, Y. Nakano, T. Nakamura, T. Hosoi, and T. Shimura, "Novel Approach for Improving Interface Quality of 4H-SiC MOS Devices with UV Irradiation and Subsequent Thermal Annealing," Mater. Sci. Forum, 740-742, p. 741 (2013).
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Efficient characterization of threshold voltage instabilities in SiC nMOSFETs using the concept of capture-emission-time maps
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G. Pobegen and T. Grasser, "Efficient Characterization of Threshold Voltage Instabilities in SiC nMOSFETs Using the Concept of Capture-Emission-Time Maps," Mater. Sci. Forum, 740-742, p. 757 (2013).
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A.J. Lelis, R. Green, and D. Habersat, "High-Temperature Reliability of SiC Power MOSFETs," Mater. Sci. Forum, 679-680, p. 599 (2011).
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R. Green, A. Lelis, and D. Habersat, "Application of Reliability Test Standards to SiC Power MOSFETs," 2011 Intl. Rel. Physics Symposium Proc. 11, p. 756 (2011).
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A. Lelis, R. Green, and D. Habersat, "Effect of Threshold-Voltage Instability on SiC Power MOSFET High-Temperature Reliability," ECS Transactions, 41(8), p. 203 (2011).
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R. Green, A. Lelis, and D. Habersat, "Charge Trapping in SiC Power MOSFETs and its Consequences for Robust Reliability Testing," Mater. Sci. Forum, 717-720, p. 1085 (2012).
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A. Lelis, R. Green, M. El, and D. Habersat, "Effect of Stress and Measurement Conditions in Determining the Reliability of SiC Power MOSFETs," ECS Transactions, 50(3), p. 251 (2012).
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A.J. Lelis, D. Habersat, F. Olaniran, B. Simons, J.M. McGarrity, F.B. McLean, and N. Goldsman, "Time-Dependent Bias Stress-Induced Instability of SiC MOS Devices" Mater. Res. Soc. Symp. Proc., 911, article 0911-B13-05 (2006).
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Mechanisms responsible for improvement of 4H-SiC/SiO2 interface properties by nitridation
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V.V. Afanas'ev, A. Stesmans, F. Ciobanu, G. Pensl, K.Y. Cheong, and S. Dimitrijev, "Mechanisms responsible for improvement of 4H-SiC/SiO2 interface properties by nitridation," Appl. Phys. Lett., 82(4), p. 568 (2003).
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Improved observation of SiC/SiO2 oxide charge trapping using MOS C-V
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D. Habersat and A. Lelis, "Improved Observation of SiC/SiO2 Oxide Charge Trapping Using MOS C-V," Mater. Sci. Forum, 679-680, p. 366 (2011).
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The effect of nitridation on SiC MOS oxides as evaluated by charge pumping
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D.B. Habersat, A.J. Lelis, J.M. McGarrity, F.B. McLean and S. Potbhare, "The Effect of Nitridation on SiC MOS Oxides as Evaluated by Charge Pumping," Mater. Sci. Forum, 600-603, p. 743 (2009).
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Two-way tunneling model of oxide trap charging and discharging in SiC MOSFETs
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A.J. Lelis, D. Habersat, R. Green, and N. Goldsman, "Two-way Tunneling Model of Oxide Trap Charging and Discharging in SiC MOSFETs," Mater. Sci. Forum, 717-720, p. 465 (2012).
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A study of high temperature DC and AC gate stressing on the performance and reliability of power SiC MOSFETs
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Ronald Green, A. Lelis, M. El, and D. Habersat, "A Study of High Temperature DC and AC Gate Stressing on the Performance and Reliability of Power SiC MOSFETs," Mater. Sci. Forum, 740-742, p. 549 (2013).
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Evaluation of PBTS and NBTS in SiC MOS using in situ charge pumping measurements
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D.B. Habersat, A. J. Lelis, R. Green, and M. El, "Evaluation of PBTS and NBTS in SiC MOS Using In Situ Charge Pumping Measurements," Mater. Sci. Forum, 740-742, p. 545 (2013).
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Temperature-dependence of SiC MOSFET threshold-voltage instability
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A.J. Lelis, D. Habersat, R. Green, and N. Goldsman, "Temperature- Dependence of SiC MOSFET Threshold-Voltage Instability," Mater. Sci. Forum, 600-603, p. 807 (2009).
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Detection of mobile ions in the presence of charge trapping in SiC MOS devices
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D.B. Habersat, A. Lelis, and R. Green, "Detection of Mobile Ions in the Presence of Charge Trapping in SiC MOS Devices," Mater. Sci. Forum, 717-720, p. 461 (2012).
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C.X. Zhang, E. Zhang, D. Fleetwood, R. Schrimpf, S. Dhar, S.-H. Ryu, X. Shen, and S. Pantelides, "Effects of Bias on the Irradiation and Annealing Responses of 4H-SiC MOS Devices," IEEE Trans. Nucl. Sci., 58(6), p. 2925 (2011).
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C.J. Cochrane, P.M. Lenahan, and A.J. Lelis, "An Electrically Detected Magnetic Resonance Study of Performance Limiting Defects in SiC Metal Oxide Semiconductor Field Effect Transistors," J. Appl. Phys., 109, 014506 (2011).
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J. Appl. Phys.
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