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Reliabilty of SiC Power Devices and its Influence on their Commercialization - Review, Status, and Remaining Issues
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A. Lelis, D. Habersat, R. Green, A. Ogunniyi, M. Gurfinkel, J. Suehle, and N. Goldsman,"Time Dependence of Bias-Stress-Induced SiC MOSFET Threshold-Voltage Instability Measurements,"IEEE Trans. Electron Devices, vol 55, no. 8, pp. 1835-1840, 2008.
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M. Gurfinkel, J. Suehle, J. B. Bernstein, Y. Shapira, and A. J. Lelis, D. Habersat, N. Goldsman,"Ultra-Fast Characterization of Transient Gate Oxide Trapping in SiC MOSFETs,"IEEE IRPS, pp. 462-466, 2007.
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