Pulsed rf magnetron sputtered alumina thin films

Ceramics International

Volumn 40, Issue 7 PART A, 2014, Pages 9571-9582

  Reddy, I Neelakanta ^a,b   Reddy, V Rajagopal ^b   Sridhara, N ^a   Rao, V Sasidhara ^a   Bhattacharya, Manjima ^c   Bandyopadhyay, Payel ^c   Basavaraja, S ^d   Mukhopadhyay, Anoop Kumar ^c   Sharma, Anand Kumar ^a   Dey, Arjun ^a  

^a INDIAN SPACE RESEARCH ORGANISATION   (India)

^b SRI VENKATESWARA UNIVERSITY   (India)

^c CSIR CENTRAL GLASS AND CERAMIC RESEARCH INSTITUTE   (India)

^d JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

Author keywords

Alumina; Nanomechanical properties; Sputtering; Thermo optical properties; Thin films

Indexed keywords

EID: 84900433602     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2014.02.032     Document Type: Article

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