Effect of substrate temperature on microstructure and optical properties of nanocrystalline alumina thin films

Ceramics International

Volumn 39, Issue 8, 2013, Pages 9017-9023

  Balakrishnan, G ^a   Tripura Sundari, S ^b   Ramaseshan, R ^b   Thirumurugesan, R ^b   Mohandas, E ^b   Sastikumar, D ^c   Kuppusami, P ^d   Kim, T G ^e   Song, J I ^a  

^a Changwon National University   (South Korea)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^c NATIONAL INSTITUTE OF TECHNOLOGY   (India)

^d SATHYABAMA UNIVERSITY   (India)

^e Pusan National University   (South Korea)

Author keywords

Alumina; C. Optical properties; Pulsed laser deposition; Thin films; X ray diffraction

Indexed keywords

HARDNESS VALUES; LOW SUBSTRATE TEMPERATURE; NANOCRYSTALLINE ALUMINAS; OXYGEN PARTIAL PRESSURE; QUARTZ SUBSTRATE; SUBSTRATE TEMPERATURE; UV VISIBLE SPECTROSCOPY; X-RAY DIFFRACTION STUDIES;

ALUMINA; ALUMINUM; AMORPHOUS FILMS; AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; FILM PREPARATION; NANOINDENTATION; PULSED LASER DEPOSITION; QUARTZ; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

SUBSTRATES;

EID: 84883804209     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2013.04.104     Document Type: Article

References (46)

1. R.F. Bunshah Handbook of Hard Coatings 2001 Noyes Publications New Jersey
2. 3 nanoceramic films Ceramics International 39 2013 3157 3163
3. D.H. Kuo, B.Y. Cheung, and R.J. Wu Growth and properties of alumina films obtained by low-pressure metal-organic chemical vapor deposition Thin Solid Films 398-399 2001 35 40
4. M. Aguilar-Frutis, M. Garcia, and C. Falcony Optical and electrical properties of aluminum oxide films deposited by spray pyrolysis Applied Physics Letters 72 1998 1700 1702
5. C.H. Lin, H.L. Wang, and M.H. Hon The effect of residual stress on the adhesion of PECVD-coated aluminum oxide film on glass Thin Solid Films 283 1996 171 174
6. M. Hiratani, K. Torii, Y. Shimamoto, and S.I. Saito Built-in interface in high-κ gate stacks Applied Surface Science 216 2003 208 214
7. 3 thin films Thin Solid Films 520 2012 2689 2694
8. H.L. Wang, C.H. Lin, and M.H. Hon The dependence of hardness on the density of amorphous alumina thin films by PECVD Thin Solid Films 310 1997 260 264
9. 3 films Solar Energy Materials and Solar Cells 59 1999 355 366
10. J. Park, Y.Y. Noh, J.W. Huh, J. Lee, and H. Chu Optical and barrier properties of thin-film encapsulations for transparent OLEDs Organic Elecronics 13 2012 1956 1961
11. J. Wanga, Y.H. Yub, S.C. Leeb, and Y.W. Chung Tribological and optical properties of crystalline and amorphous alumina thin films grown by low-temperature reactive magnetron sputter-deposition Surface and Coatings Technology 146-147 2001 189 194
12. K. Tadanaga, J. Morinaga, A. Matsuda, and T. Minami Superhydrophobic- superhydrophilic micropatterning on flowerlike alumina coating film by the sol-gel method Chemistry of Materials 12 3 2000 590 592
13. J.W. Lee, C.W. Won, B.S. Chun, and H.Y. Sohn Dip coating of alumina films by the sol-gel method Journal of Materials Research 8 1993 3151 3157
14. G. Yi, and M. Sayer Sol-gel processing of complex oxide films Ceramic Bulletin 70 1991 1173 1179
15. C.M. Chiang, and L.S. Chang Microstructure and characterization of aluminum oxide thin films prepared by reactive RF magnetron sputtering on copper Surface and Coatings Technology 198 2005 152 155
16. C.H. Lin, H.L. Wang, and M.H. Hon Preparation and characterization of aluminum oxide films by plasma enhanced chemical vapor deposition Surface and Coatings Technology 90 1997 102 106
17. B. Behkam, Y. Yang, and M. Asheghi Thermal property measurement of thin aluminum oxide layers for giant magnetoresistive application International Journal of Heat and Mass Transfer 48 2005 2023 2031
18. 3films Ceramics International 29 2003 427 434
19. A.W. Adamson Physical Chemistry of Surfaces 5th ed. 1990 Wiley New York
20. Y. Wang, J. Wang, M. Shen, and W. Wang Synthesis and properties of thermostable γ-alumina prepared by hydrolysis of phosphide aluminum Journal of Alloys and Compounds 467 2009 405 412
21. 3 thin films prepared by electron beam evaporation and spray pyrolysis method Materials Science and Engineering B 106 2004 269 274
22. 3 layers deposited by plasma activated electron beam evaporation Surface and Coatings Technology 151-152 2002 14 20
23. G. Balakrishnan, P. Kuppusami, S. Tripura Sundari, R. Thirumurugesan, V. Ganesan, E. Mohandas, and D. Sastikumar Structural and optical properties of γ-alumina thin films prepared by pulsed laser deposition Thin Solid Films 518 2010 3898 3902
24. C. Cibert, H. Hidalgo, C. Champeaux, P. Tristant, C. Tixier, J. Desmaison, and A. Catherinot Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition Thin Solid Films 516 2008 1290 1296
25. 3 optical waveguides prepared by pulsed laser deposition Applied Physics A: Materials and Processing 69 1999 S735 S738
26. J. Gottmann, and E.W. Kreutz Pulsed laser deposition of alumina and zirconia thin films on polymers and glass as optical and protective coatings Surface and Coatings Technology 116-119 1999 1189 1194
27. K.R. Murali, and P. Thirumoorthy Characteristics of sol-gel deposited alumina films Journal of Alloys and Compounds 500 2010 93 95
28. C.H. Peng, C.C. Hwang, and C.S. Hsiao Structure and photoluminescence properties of strong blue-emitting alumina film developed from a liquid sol at low temperature Journal of Alloys and Compounds 491 2010 L29 L32
29. B.K. Tay, Z.W. Zhao, and D.H.C. Chua Review of metal oxide films deposited by filtered cathodic vacuum arc technique Materials Science and Engineering R 52 2006 1 48
30. 3 films deposited by metalorganic chemical vapor deposition Surface and Coatings Technology 176 2004 382 384
31. S. Anders, A. Anders, M. Rubin, Z. Wang, S. Raoux, F. Kong, and I.G. Brown Formation of metal oxides by cathodic arc deposition Surface and Coatings Technology 76-77 1995 167 173
32. G. Balakrishnan, S. Tripura Sundari, P. Kuppusami, P. Chandra Mohan, M.P. Srinivasan, E. Mohandas, V. Ganesan, and D. Sastikumar A study of microstructural and optical properties of nanocrystalline ceria thin films prepared by pulsed laser deposition Thin Solid Films 519 2011 2520 2526
33. G. Balakrishnan, K. Thanigaiarul, P. Sudhakara, and Jung Il Song Microstructural and optical properties of nanocrystalline undoped zirconia thin films prepared by pulsed laser deposition Applied Physics A: Materials Science and Processing 110 2013 427 432
34. R.M.A. Azzam, and N.M. Bashara Ellipsometry and Polarized light 1988 North-Holland Amsterdam
35. E.D. Palik (Ed.), Hand Book of Optical Constants of Solids, vol. II, Academic Press, 1998.
36. M. Erman, J.B. Theeten, P. Chambon, S.M. Kelso, and D.E. Aspnes Optical properties and damage analysis of GaAs single crystals partly amorphized by ion implantation Journal of Applied Physics 56 1984 2664 2671
37. C.C. Lee, D.T. Wei, J.C. Hsu, and C.H. Shen Influence of oxygen on some oxide films prepared by ion beam sputter deposition Thin Solid Films 290-291 1996 88 93
38. Z.W. Zhao, B.K. Tay, L. Huang, S.P. Lau, and J.X. Gao Influence of thermal annealing on optical properties and structure of aluminum oxide thin films by filtered cathodic vacuum arc Optical Materials 27 2004 465 469
39. G. Balakrishnan, T.N. Sairam, P. Kuppusami, R. Thiumurugesan, E. Mohandas, V. Ganesan, and D. Sastikumar Influence of oxygen partial pressure on the properties of pulsed laser deposited nanocrystalline zirconia thin films Applied Surface Science 257 2011 8506 8510
40. K. Koski, J. Holsa, and P. Juliet Properties of aluminum oxide thin films deposited by reactive magnetron sputtering Thin Solid Films 339 1999 240 248
41. J.M. Schneider, W.D. Sproul, R.W.J. Chia, M.S. Wong, and A. Matthews Very-high-rate reactive sputtering of alumina hard coatings Surface and Coatings Technology 96 1997 262 266
42. 3 layers by means of bipolar pulsed magnetron sputtering Surface and Coatings Technology 86-87 1996 657 663
43. M. Aguilar-Frutis, M. Garcia, C. Falcony, G. Plesch, and S. Jimenez-Sandoval A study of the dielectric characteristics of aluminum oxide thin films deposited by spray pyrolysis from Al(acac)3 Thin Solid Films 389 2001 200 206
44. 3 thin films Vacuum 45 1994 97 102
45. A. Schutze, and D.T. Quinto Pulsed plasma-assisted PVD sputter-deposited alumina thin films Surface and Coatings Technology 162 2003 174 182
46. Z.W. Zhao, B.K. Tay, and D. Sheeja Structural characteristics and mechanical properties of aluminum oxide thin films prepared by off-plane filtered cathodic vacuum arc system Surface and Coatings Technology 167 2003 234 239