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Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 152-155
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Microstructure and characterization of aluminum oxide thin films prepared by reactive RF magnetron sputtering on copper
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Author keywords
Aluminum oxide; Copper; DTG; RF reactive sputtering; TEM; Thin films
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Indexed keywords
ALUMINUM COMPOUNDS;
AUGER ELECTRON SPECTROSCOPY;
COPPER;
MAGNETRON SPUTTERING;
MICROSTRUCTURE;
THERMOGRAVIMETRIC ANALYSIS;
TRANSMISSION ELECTRON MICROSCOPY;
ALUMINUM OXIDE THIN FILMS;
ARGON FLOW RATE;
COPPER SUBSTRATES;
OXYGEN FLOW RATES;
THIN FILMS;
ALUMINUM OXIDE;
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EID: 20744448399
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.10.129 Document Type: Article |
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Times cited : (13)
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References (10)
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