Overview of optical properties of Al2O3 films prepared by various techniques

Thin Solid Films

Volumn 520, Issue 16, 2012, Pages 5405-5408

  Houska, J ^a   Blazek, J ^a   Rezek, J ^a   Proksova, S ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Aluminum oxide; Annealing; High power impulse magnetron sputtering; Magnetron sputtering; Optical properties; Refractive index

Indexed keywords

ALUMINUM OXIDES; ANNEALING TEMPERATURES; DEPOSITION PARAMETERS; EXTINCTION COEFFICIENTS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); INERT ATMOSPHERES; OPTICAL CHARACTERIZATION; PREPARATION TECHNIQUE; PULSED MAGNETRON SPUTTERING; STRUCTURE AND PROPERTIES;

ANNEALING; FILM PREPARATION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY;

ALUMINUM;

EID: 84861750675     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.113     Document Type: Article

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