Structure, morphology and optical properties of SiO 2-x thin films prepared by plasma-assisted pulsed laser deposition

Applied Surface Science

Volumn 254, Issue 6, 2008, Pages 1730-1735

  He, Xiliang ^a,b   Wu, Jiehua ^a   Wu, Lingnan ^a   Zhao, Lili ^a   Gao, Xiangdong ^a   Li, Xiaomin ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Optical properties; Plasma assistance; Pulsed laser deposition; Silicon oxide; Thin films

Indexed keywords

AMORPHOUS SILICON; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; SILICA;

AMORPHOUS SILICON OXIDE; PLASMA ASSISTANCE; PLASMA-ASSISTED PULSED LASER DEPOSITION; SILICON OXIDE;

THIN FILMS;

EID: 37349101027     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.07.127     Document Type: Article

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