Growth of highly oriented γ- And α-Al2O3 thin films by pulsed laser deposition

Optics and Laser Technology

Volumn 56, Issue , 2014, Pages 317-321

  Balakrishnan, G ^a,b   Babu, R Venkatesh ^b   Shin, K S ^a   Song, J I ^a  

^a Changwon National University   (South Korea)

^b BHARATH UNIVERSITY   (India)

Author keywords

Alumina thin films; Pulsed laser deposition; X ray diffraction

Indexed keywords

ALUMINA THIN FILMS; ALUMINUM OXIDES; MGO(1 0 0); ORIENTED GROWTH; OXYGEN PARTIAL PRESSURE; ROOT MEAN SQUARE; SINGLE CRYSTAL SUBSTRATES; X-RAY DIFFRACTION STUDIES;

ATOMIC FORCE MICROSCOPY; MAGNESIA; PULSED LASER DEPOSITION; STRONTIUM TITANATES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION;

ALUMINUM;

EID: 84885145734     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2013.08.014     Document Type: Article

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