The use of highly ionized pulsed plasmas for the synthesis of advanced thin films and nanoparticles

KONA Powder and Particle Journal

Volumn 31, Issue 1, 2014, Pages 171-180

  Pilch, Iris ^a   Söderström, Daniel ^a   Lundin, Daniel ^b   Helmersson, Ulf ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Ionautics AB   (Sweden)

Author keywords

HiPIMS; HPPMS; IPVD; Nanoparticle synthesis; Sputtering; Thin films

Indexed keywords

DEGREE OF IONIZATION; HIPIMS; HPPMS; IPVD; NANOPARTICLE GROWTHS; NANOPARTICLE SYNTHESIS; SURFACE ENGINEERING; TRAPPING PROBABILITIES;

DEPOSITION; ELECTRIC DISCHARGES; FILM GROWTH; IONIZATION; MATERIALS; NANOPARTICLES; PLASMA DENSITY; PLASMAS; SPUTTERING; THIN FILMS;

SYNTHESIS (CHEMICAL);

EID: 84897712230     PISSN: 02884534     EISSN: 21875537     Source Type: Journal    
DOI: 10.14356/kona.2014008     Document Type: Article

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