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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 1, 1999, Pages 310-313

Hollow cathode sputtering cluster source for low energy deposition: Deposition of Fe small clusters

(3) Ishii, K a Amano, K a Hamakake, H a

a UTSUNOMIYA UNIVERSITY (Japan)

Author keywords

Fe

Indexed keywords

EID: 85000759007 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.581585 Document Type: Letter

Times cited : (25)

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