Advantages of nanocomposite coatings deposited by high power pulse magnetron sputtering technology

Journal of Materials Processing Technology

Volumn 209, Issue 1, 2009, Pages 165-170

  Bobzin, K ^a   Bagcivan, N ^a   Immich, P ^a   Bolz, S ^a   Alami, J ^b   Cremer, R ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b CemeCon AG   (Germany)

Author keywords

(Ti,Al,Si)N; Deposition rate; HPPMS; Microstructure; Nanocomposites

Indexed keywords

ALUMINUM; COATINGS; CUTTING TOOLS; DC GENERATORS; FILM GROWTH; INORGANIC COATINGS; MACHINE TOOLS; MACHINING; MAGNETRON SPUTTERING; MAGNETRONS; METAL WORKING TOOLS; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; POWER CONVERTERS; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE STRUCTURE; TUNGSTEN; TUNGSTEN CARBIDE;

(TI,AL,SI)N; COATING COMPOSITIONS; COATINGS PROPERTIES; CUTTING EDGES; CUTTING PARAMETERS; DENSER STRUCTURES; DIRECT CURRENTS; DRY MACHINING; GRAIN SIZES; HARDNESS VALUES; HIGH SPEEDS; HIGH-POWER; HPPMS; MANUFACTURING SECTORS; N FILMS; NANO-INDENTATION; NANOCOMPOSITE COATINGS; PVD COATINGS; SCANNING ELECTRON MICROSCOPES; SEM PICTURES; SI CONTENTS; SMOOTHER SURFACES; THERMAL STABILITIES; THICKNESS UNIFORMITIES; X-RAY DIFFRACTIONS;

HARD COATINGS;

EID: 54049145179     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.01.035     Document Type: Article

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