A novel high-power pulse PECVD method

Surface and Coatings Technology

Volumn 206, Issue 22, 2012, Pages 4562-4566

  Pedersen, Henrik ^a   Larsson, Petter ^a   Aijaz, Asim ^a   Jensen, Jens ^a   Lundin, Daniel ^a,b  

^a LINKÖPING UNIVERSITY   (Sweden)

^b UNIVERSITÉ PARIS SUD   (France)

Author keywords

Amorphous carbon; Hollow cathode; PECVD; Pulsed plasma discharges

Indexed keywords

AMORPHOUS CARBON COATING; BULK PLASMA; DC MODE; DEGREE OF IONIZATION; DIRECT CURRENT; ENERGETIC PARTICLE BOMBARDMENT; HIGH DEPOSITION RATES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGH-POWER; HIGH-POWER PULSE; HIGHLY-IONIZED; HOLLOW CATHODE DISCHARGE; HOLLOW CATHODES; HYDROGEN CONTENTS; INPUT POWER; IONIZED PLASMAS; IONIZED PVD; OPERATING CONDITION; POROUS SURFACE; PULSED MODE; PULSED PLASMA DISCHARGES; RUNNING-IN; SHORT PULSE; SPUTTERED MATERIALS;

AMORPHOUS CARBON; CARBON FILMS; CATHODES; COPPER; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; IONIZATION; PLASMA CVD; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

DC POWER TRANSMISSION;

EID: 84862502804     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.05.007     Document Type: Article

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