Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3530-3534

  Peters, Richard D ^a   Yang, Xiao M ^a   Wang, Qiang ^a   De Pablo, Juan J ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; INTERFEROMETRY; LITHOGRAPHY; MONOLAYERS; NANOTECHNOLOGY; PHASE SEPARATION; POLYMETHYL METHACRYLATES; POLYSTYRENES; SILANES; THIN FILMS; WETTING;

OCTADECYLTRICHLOROSILANE; ULTRAVIOLET INTERFEROMETRIC LITHOGRAPHY;

PLASTIC FILMS;

EID: 0034315299     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1313572     Document Type: Article

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