Nanostructured plasma polymers

Thin Solid Films

Volumn 548, Issue , 2013, Pages 1-17

  Kylian O ^a   Choukourov, A ^a   Biederman, H ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Nanoparticles; Nanostructured surface; Plasma polymer

Indexed keywords

ELECTRIC DISCHARGES; FILM PREPARATION; MAGNETRONS; NANOPARTICLES; PLASMA APPLICATIONS; PLASMA ETCHING; POLYMER FILMS;

COLLOIDAL LITHOGRAPHY; GAS AGGREGATION CLUSTER SOURCES; LOW PRESSURE DISCHARGE; NANOSTRUCTURED SURFACE; NANOSTRUCTURED THIN FILM; PLASMA POLYMER FILMS; PLASMA POLYMERS; WORKING GAS PRESSURE;

PLASMA POLYMERIZATION;

EID: 84887498259     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.09.003     Document Type: Review

References (133)

1. M.P. Wilde Ber. Deut. Bot. Ges. 7 1874 352
2. A. Thenard, and C.R. Hebd Seances Acad. Sci. 78 1874 219
3. O. Eisenhut, and R. Conrad Z. Elektrochem. 36 1930 654
4. W.B. Harkins, and J.M. Jackson J. Chem. Phys. 1 1933 37
5. W.B. Harkins Trans. Faraday Soc. 30 1934 221
6. R. Conrad Trans. Faraday Soc. 30 1934 215
7. H. König, and G. Helwig Z. Phys. 129 1951 491
8. H. Schmellenmeier Exp. Tech. Phys. 1 1953 49
9. H. Biederman, and Y. Osada Plasma Polymerisation Processes 1992 ELSEVIER Amsterdam
10. H. Biederman Plasma Polymer Films 2004 Imperial College Press London
11. J. Goodman J. Polym. Sci. 44 1960 551
12. A.P. Bradley, and J.P. Hammes J. Electrochem. Soc. 110 1963 15
13. D.K. Lam, R.F. Badour, and A.F. Stancel M. Shen, Plasma Chemistry of Polymers 1976 Marcel Dekker New York
14. H. Yasuda, and T. Hsu Surf. Sci. 76 1978 232
15. H. Yasuda Plasma Polymerization 1985 Academic Press New York
16. H.-U. Poll, M. Arzt, and K.-H. Wickleder Eur. Polym. J. 12 1976 505
17. R. d'Agostino, F. Cramarossa, F. Fracassi, and F. Illuzzi R. d'Agostino, Acad. Press 95 1990
18. R. d'Agostino R. d'Agostino, P. Favia, F. Fracassi, Kluwer Acad. Publ., NATO ASI Series, E: Appl. Sci 346 1997 1
19. R. d'Agostino, F. Cramarossa, and F. Illuzzi J. Appl. Phys. 61 1987 2754
20. R. d'Agostino, P. Favia, and F. Fracassi J. Polym. Sci. A Polym. Chem. 28 1990 3387
21. H. Kobayashi, A.T. Bell, and M. Shen J. Appl. Polym. Sci. 17 1973 885
22. M. Niinomi, H. Kobayashi, A.T. Bell, and M. Shen J. Appl. Phys. 44 1973 4317
23. H. Kobayashi, M. Shen, and A.T. Bell J. Macromol. Sci. A Chem. 8 1974 373
24. R. Gristina, E. D'Aloia, G.S. Senesi, A. Milella, M. Nardulli, E. Sardella, P. Favia, and R. d'Agostino J. Biomed. Mat. Res. Part B: Appl. Biomat. 88B 2009 139
25. G. Cicala, A. Milella, F. Palumbo, P. Favia, and R. d'Agostino Diamond Relat. Mater. 12 2003 2020
26. A. Milella, F. Palumbo, P. Favia, G. Cicala, and R. d'Agostino Pure Appl. Chem. 77 2005 399
27. A. Milella, R. Di Mundo, F. Palumbo, P. Favia, F. Fracassi, and R. d'Agostino Plasma Processes Polym. 6 2009 460
28. R. Di Mundo, R. Gristina, E. Sardella, F. Intranuovo, M. Nardulli, A. Milella, F. Palumbo, R. d'Agostino, and P. Favia Plasma Processes Polym. 7 2010 212
29. V. Kumar, J. Pulpytel, and F. Arefi-Khonsari Plasma Processes Polym. 7 2010 939
30. F. Intranuovo, E. Sardella, P. Rossini, R. d'Agostino, and P. Favia Chem. Vap. Depos. 15 2009 95
31. Y. Yamada, K. Tanaka, and K. Saito Surf. Coat. Technol. 44 1990 618
32. N. Maréchal J. Vac. Sci. Technol. A Vac. Surf. Sci. 10 1992 477
33. I. Sugimoto, and R. Shimada Thin Solid Films 338 1999 291
34. H.J. Qi, Y.B. Fu, D. Wang, X.X. Yang, K.Y. Sui, and Z.L. Ma Surf. Coat. Technol. 131 2000 177
35. Y. Zhang, G. Yang, E. Kang, and K. Neoh Langmuir 18 2002 6373
36. M. Drábik, O. Polonskyi, O. Kylián, J. Čechvala, A. Artemenko, I. Gordeev, A. Choukourov, D. Slavínská, I. Matolínová, and H. Biederman Plasma Processes Polym. 7 2010 544
37. O. Kylián, M. Drábik, O. Polonskyi, J. Čechvala, A. Artemenko, I. Gordeev, A. Choukourov, I. Matolínová, D. Slavínská, and H. Biederman Thin Solid Films 519 2011 6426
38. K.S. Siow, L. Britcher, S. Kumar, and H.J. Griesser Plasma Processes Polym. 3 2006 392
39. A. Choukourov, H. Biederman, I. Kholodkov, D. Slavinska, M. Trchova, and A. Holländer J. Appl. Polym. Sci. 92 2004 979
40. F. Truica-Marasescu, and M.R. Wertheimer Plasma Processes Polym. 5 2008 44
41. L. Denis, P. Marsal, Y. Olivier, T. Gogfroid, R. Lazzaroni, M. Hecq, J. Cornil, and R. Snyders Plasma Processes Polym. 7 2010 172
42. P.-L. Girard-Lauriault, F. Mwale, M. Iordanova, C. Demers, P. Desjardins, and M.R. Wertheimer Plasma Processes Polym. 2 2005 263
43. O. Kylián, J. Hanuš, A. Choukourov, J. Kousal, D. Slavínská, and H. Biederman J. Phys. D: Appl. Phys. 42 2009 142001
44. A. Choukourov, H. Biederman, D. Slavinska, L. Hanley, A. Grinevich, H. Boldyryeva, and A. Mackova J. Phys. Chem. B 109 2005 23086
45. A. Michelmore, P. Martinek, V. Sah, R.D. Short, and K. Vasilev Plasma Processes Polym. 8 2011 367
46. T. Witten, and L. Sander Phys. Rev. Lett. 47 1981 1400
47. Choukourov, unpublished.
48. T. Baldacchini, J.E. Carey, M. Zhou, and E. Mazur Langmuir 22 2006 4917
49. T. Ishizaki, N. Saito, and O. Takai Langmuir 26 2010 8147
50. Y. Wu, H. Sugimura, Y. Inoue, and O. Takai Thin Solid Films 435 2003 161
51. O. Takai, A. Hozumi, and N. Sugimoto J. Non-Cryst. Solids 218 1997 280
52. J.P. Youngblood, and T.J. McCarthy Macromolecules 32 1999 6800
53. E. Wohlfart, J.P. Fernández-Blázquez, E. Arzt, and A. del Campo Plasma Processes Polym. 8 2011 876
54. R. Leitel, A. Kaless, U. Schulz, and N. Kaiser Plasma Processes Polym. 4 2007 S878
55. A.D. Tserepi, M.-E. Vlachopoulou, and E. Gogolides Nanotechnology 17 2006 3977
56. K. Tsougeni, A. Tserepi, G. Boulousis, V. Constantoudis, and E. Gogolides Plasma Processes Polym. 4 2007 398
57. M. Manca, B. Cortese, I. Viola, A.S. Arico, R. Cingolani, and G. Gigli Langmuir 24 2008 1833
58. E. Wohlfart, J.P. Fernández-Blázquez, E. Knoche, A. Bello, E. Pérez, E. Arzt, and A. del Campo Macromolecules 43 2010 9908
59. J.P. Fernández-Blázquez, D. Fell, E. Bonaccurso, and A. del Campo J. Colloid Interface Sci. 357 2011 234
60. R. Di Mundo, V. De Benedictis, F. Palumbo, and R. d'Agostino Appl. Surf. Sci. 255 2009 5461
61. K. Tsougeni, N. Vourdas, A. Tserepi, E. Gogolides, and C. Cardinaud Langmuir 25 2009 11748
62. L.-M. Lacroix, M. Lejeune, L. Ceriotti, M. Kormunda, T. Meziani, P. Colpo, and F. Rossi Surf. Sci. 592 2005 182
63. M. Lejeune, L.M. Lacroix, F. Brétagnol, A. Valsesia, P. Colpo, and F. Rossi Langmuir 22 2006 3057
64. A. Goessl, D.F. Bowen-Pope, and A.S. Hoffman J. Biomed. Mater. Res. 57 2001 15
65. A. Goessl, M.D. Garrison, J.-B. Lhoest, and A.S. Hoffman J. Biomater. Sci. Polym. Ed. 12 2001 721
66. F. Brétagnol, A. Valsesia, T. Sasaki, G. Ceccone, P. Colpo, and F. Rossi Adv. Mater. 19 2007 1947
67. P. Favia, E. Sardella, R. Gristina, and R. d'Agostino Surf. Coat. Technol. 169-170 2003 707
68. O. Soppera, A. Dirani, A. Ponche, and V. Roucoules Nanotechnology 19 2008 395304
69. A. Dirani, F. Wieder, V. Roucoules, A. Airoudj, and O. Soppera Plasma Processes Polym. 7 2010 571
70. S.-M. Yang, S.G. Jang, D.-G. Choi, S. Kim, and H.K. Yu Small 2 2006 458
71. C. Corbella, S. Portal, M. Rubio-Roy, M.A. Vallvé, J. Ignés-Mullol, E. Bertran, and J.L. Andújar Diamond Relat. Mater. 19 2010 1124
72. I. Badge, S.P. Bhawalkar, L. Jia, and A. Dhinojwala Soft Matter 9 2013 3032
73. G. Singh, H.J. Griesser, K. Bremmell, and P. Kingshott Adv. Funct. Mater. 21 2011 540
74. D.-G. Choi, H.K. Yu, S.G. Jang, and S.-M. Yang J. Am. Chem. Soc. 126 2004 7019
75. A. Valsesia, P. Colpo, M. Manso Silvan, T. Meziani, G. Ceccone, and F. Rossi Nano Lett. 4 2004 1047
76. E. Sardella, L. Detomaso, R. Gristina, G.S. Senesi, H. Agheli, D.S. Sutherland, R. d'Agostino, and P. Favia Plasma Processes Polym. 5 2008 540
77. B.R. Pistillo, R. Gristina, E. Sardella, S. Lovascio, P. Favia, M. Nardulli, and R. D'Agostino Plasma Processes Polym. 6 2009 S61
78. K. Ellinas, A. Tserepi, and E. Gogolides Langmuir 27 2011 3960
79. K. Ellinas, A. Smyrnakis, A. Malainou, A. Tserepi, and E. Gogolides Microelectron. Eng. 88 2011 2547
80. M. Lejeune, A. Valsesia, M. Kormunda, P. Colpo, and F. Rossi Surf. Sci. 583 2005 L142
81. A. Valsesia, T. Meziani, F. Bretagnol, P. Colpo, G. Ceccone, and F. Rossi J. Phys. D: Appl. Phys. 40 2007 2341
82. A. Valsesia, P. Colpo, I. Mannelli, S. Mornet, F. Bretagnol, G. Ceccone, and F. Rossi Anal. Chem. 80 2008 1418
83. S. Mornet, F. Brétagnol, I. Mannelli, A. Valsesia, L. Sirghi, P. Colpo, and F. Rossi Small 4 2008 1919
84. A. Bouchoule Dusty Plasmas: Physics, Chemistry, and Technological Impact in Plasma Processing 1999 Wiley New York
85. M. Bonitz, C. Henning, and D. Block Rep. Prog. Phys. 73 2010 066501
86. J. Berndt, E. Kovačević, I. Stefanović, O. Stepanović, S.H. Hong, L. Boufendi, and J. Winter Contrib. Plasma Phys. 49 2009 107
87. T.G. Northrop Phys. Scr. 45 1992 475
88. A. Garscadden, B.N. Ganguly, P.D. Haaland, and J. Williams Plasma Sources Sci. Technol. 3 1994 239
89. A.A. Fridman, L. Boufendi, T. Hbid, B.V. Potapkin, and A. Bouchoule J. Appl. Phys. 79 1996 1303
90. V.N. Tsytovich, G.E. Morfill, and H. Thomas Plasma Phys. Rep. 28 2002 623
91. V.E. Fortov, A.V. Ivlev, S.A. Khrapak, Khrapak, and G.E. Morfill Phys. Rep. 421 2005 1
92. Y. Watanabe J. Phys. D: Appl. Phys. 39 2006 R329
93. J. Berndt, S. Hong, E. Kovačević, I. Stefanović, and J. Winter Vacuum 71 2003 377
94. F. Bronold, H. Fehske, H. Kersten, and H. Deutsch Phys. Rev. Lett. 101 2008 175002
95. H.R. Maurer, and H. Kersten J. Phys. D: Appl. Phys. 44 2011 174029
96. F. Galli, and U.R. Kortshagen IEEE Trans.Plasma Sci. 38 2010 803
97. U. Kortshagen J. Phys. D: Appl. Phys. 42 2009 113001
98. H. Kersten, H. Deutsch, and G.M.W. Kroesen Int. J. Mass Spectrom. 233 2004 51
99. K. Takahashi, and K. Tachibana J. Vac. Sci. Technol. A Vac. Surf. 19 2001 2055
100. S. Hong, J. Berndt, and J. Winter Plasma Sources Sci. Technol. 12 2003 46
101. R.J. Buss, and W.A. Hareland Plasma Sources Sci. Technol. 3 1994 268
102. S.V. Vladimirov, and K. Ostrikov Plasmas Polym. 8 2006 135
103. S.R. Coulson, I.S. Woodward, J.P.S. Badyal, S.A. Brewer, and C. Willis Langmuir 16 2000 6287
104. S.R. Coulson, I.S. Woodward, J.P.S. Badyal, S.A. Brewer, and C. Willis Chem. Mater. 12 2000 2031
105. D.O.H. Teare, C.G. Spanos, P. Ridley, E.J. Kinmond, V. Roucoules, J.P.S. Badyal, S.A. Brewer, S. Coulson, and C. Willis Chem. Mater. 14 2002 4566
106. V. Stelmashuk, H. Biederman, D. Slavínská, J. Zemek, and M. Trchová Vacuum 77 2005 131
107. J.C. Feng, W. Huang, G.D. Fu, E.-T. Kang, and K.-G. Neoh Plasma Processes Polym. 2 2005 127
108. S.H. Yang, C.-H. Liu, W.-T. Hsu, and H. Chen Surf. Coat. Technol. 203 2009 1379
109. V. De Vriendt, F. Maseri, A. Nonet, and S. Lucas Plasma Processes Polym. 6 2009 S6
110. V. De Vriendt, A. Felten, J.-P. Blondeau, F. Maseri, J.-J. Pireaux, and S. Lucas Surf. Coat. Technol. 205 2011 S582
111. V. De Vriendt, S.M. Miladinovic, J.L. Colaux, F. Maseri, C.L. Wilkins, and S. Lucas Langmuir ACS J. Surf. Colloids 27 2011 8913
112. J. Berndt, H. Acid, E. Kovacevic, C. Cachoncinlle, T. Strunskus, and L. Boufendi J. Appl. Phys. 113 2013 063302
113. H. Biederman Surf. Coat. Technol. 205 2011 S10
114. H. Biederman, O. Kylian, M. Drabik, A. Choukourov, O. Polonskyi, and P. Solar Surf. Coat. Technol. 211 2012 127
115. H. Haberland, M. Mall, M. Moseler, Y. Qiang, T. Reiners, and Y. Thurner J. Vac. Sci. Technol. A Vac. Surf. Films 12 1994 2925
116. T. Hihara, and K. Sumiyama J. Appl. Phys. 84 1998 5270
117. D. Datta, S.R. Bhattacharyya, I. Shyjumon, D. Ghose, and R. Hippler Surf. Coat. Technol. 203 2009 2452
118. Y. Watanabe, and N. Isomura J. Vac. Sci. Technol. A 27 2009 1153
119. M. Gracia-Pinilla, E. Martinez, G. Silva Vidaurri, and E. Perez-Tijerina Nanoscale Res. Lett. 5 2010 180
120. A.I. Ayesh, N. Qamhieh, H. Ghamlouche, S. Thaker, and M. El-Shaer J. Appl. Phys. 107 2010 034317
121. V. Straňák, S. Block, S. Drache, Z. Hubička, C.A. Helm, L. Jastrabík, M. Tichý, and R. Hippler Surf. Coat. Technol. 205 2011 2755
122. A. Marek, J. Valter, S. Kadlec, and J. Vyskočil Surf. Coat. Technol. 205 2011 S573
123. O. Polonskyi, P. Solař, O. Kylián, M. Drábik, A. Artemenko, J. Kousal, J. Hanuš, J. Pešička, I. Matolínová, E. Kolíbalová, D. Slaví nská, and H. Biederman Thin Solid Films 520 2012 4155
124. M. Drábik, A. Choukourov, A. Artemenko, J. Kousal, O. Polonskyi, P. Solař, O. Kylián, J. Matoušek, J. Pešička, I. Matolínová, D. Slavínská, and H. Biederman Plasma Processes Polym. 8 2011 640
125. M. Drabik, A. Choukourov, A. Artemenko, J. Matousek, O. Polonskyi, P. Solar, J. Pesicka, J. Lorincik, D. Slavinska, and H. Biederman Surf. Coat. Technol. 205 2011 S48
126. M. Drabik, A. Choukourov, A. Artemenko, O. Polonskyi, O. Kylian, J. Kousal, L. Nichtova, V. Cimrova, D. Slavinska, and H. Biederman J. Phys. Chem. C 115 2011 20937
127. O. Kylián, V. Valeš, O. Polonskyi, J. Pešič ka, J. Čechvala, P. Solař, A. Choukourov, D. Slaví nská, and H. Biederman Mater. Lett. 79 2012 229
128. O. Kylián, O. Polonskyi, J. Kratochvíl, A. Artemenko, A. Choukourov, M. Drábik, P. Solař, D. Slavínská, and H. Biederman Plasma Processes Polym. 9 2012 180
129. M. Drábik, A. Serov, O. Kylián, A. Choukourov, A. Artemenko, J. Kousal, O. Polonskyi, and H. Biederman Plasma Processes Polym. 9 2012 390
130. O. Polonskyi, O. Kylián, P. Solař, A. Artemenko, J. Kousal, D. Slavínská, A. Choukourov, and H. Biederman J. Phys. D: Appl. Phys. 45 2012 495301
131. P. Solař, O. Polonskyi, A. Choukourov, A. Artemenko, J. Hanuš, H. Biederman, and D. Slavínská Surf. Coat. Technol. 205 2011 S42
132. P. Solař, O. Kylián, O. Polonskyi, A. Artemenko, D. Arzhakov, M. Drábik, D. Slavínská, M. Vandrovcová, L. Bačáková, and H. Biederman Surf. Coat. Technol. 206 2012 4335
133. H. Biederman, O. Polonskyi, M. Drabik, O. Kylian, J. Kousal, J. Hanus, A. Choukourov, P. Solar, A. Serov, and D. Slavinska Proceedings of 30th ICPIG August 2011 (Belfast, Ireland)